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Front Matter: Volume 10959
Eran Amit,Jason Arjavac, P.R. Atkins, Angela Brett,Brian M. Barnes, Norman Birnstein, Sergey M. Borisov,Sascha Brose, V. Brouzet,Stefan Buhl,Benjamin Bunday,Sven Burger, Hsien-Hung Chang,Jun‐Dong Chang, Nick Chang, Alon Chen,Kai-Hsiung Chen, Cheng Zhang, Chu-Han Chiu,Kevin Chou, Hung‐Kuo Chu,James Clarke, Avi J. Cohen, Andrew Cross, Den Boef, S Desmoulins,Christophe Dezauzier, Alain C. Diebold, Hideto Dohi,J. Ducotè, Albrecht Eberle,Martin Ebert, Mark G. Eller,Fang Wei, Hans Fritz,Andreas Frommhold, L. I. Gershteǐn, Eva Giannatou,Sven Glabisch,Anna Golotsvan, V Gredy, Charles Hagen, Reza Hajiahmadi, S. Hayashi,Mark-Alexander Henn,Jan Hermans, Akiko Hirai, Katsumi Hirose, Ho‐Han Hsu, Kwang-Young Hu, Guo Cai Huang, Shang‐Yu Huang, T.J. Huisman, Joey Hunsche, Jisung Hwang,Ishikawa Masayoshi,Izawa Masayuki, J. Simon Tony, Kai Kal, Nora N. Kammer, Angela Karvtsov, N Kaufmann, Hideyuki Kazumi,Anne Kenslea, Robert S. Kern, Mehdi Kessar, Sasan Keyvani,T Kiers, Jin‐Hoi Kim, Wansoo Kim, Young‐Seok Kim, Grigory Klebanov,Dana Klein,Sung-Woo Ko, Richard Kris, P. Kruit, Stefan Kuiper,Stéphane Larivière, Le Lazzarino, Delphine Le Cunff, L Lecarpentier, Brian Lee, D. A. Lee,D.S. Lee,Ho-Se Lee, Julie Lee, Jun Lei,Bertrand Le-Gratiet, Patrick Lemaire,Shimon Levi, Susan R. Levy, John C. Lin, Yu‐Ju Lin,Rex Liu,Gian F. Lorusso, Hsiang-Lan Lung,Lu‐Fang Ma,Ruben Maas,Chris A. Mack, Jan Willem Maes,Antonio Mani,Ming Mao,Gino Marcuccilli, Melvin Mathew, T. McDaniel, Olivier Mermet, Robert Michels,A Mili,Matthieu Milléquant,Milo Renan, Hiroshi Miroku, A. Moussa, Ingrid Müller,Victoria Naipak, Dan Nelson, Duyen Thi Cam Nguyen, Nishihata Noifeld, Ondřej Novák, Ankush Oberai,Nang-Lyeom Oh, Bryan Orf, Jason W. Osborne,Alain Ostrovsky,Shyh-Shii Pai,Chan-Ha Park, Chris Park,Shin-Woong Park,Anne Pastol, Svetlana Pastur, Oliver D. Patterson, Carlos A. Pereira, Jeffrey L. Peters, C. R. M. Prentice, Jie Zhang,Ivo W. Rangelow, Ao Ren,Christoph Reuter,John Robinson,Justin Roller,Vito Rutigliani, E. A. Schweikert,Shahrjerdy Mir,Yoshiki Shiba,Yong Kong Siew, Richard T. Silver,Aileen Soco, Ewa Sommer, Hyung-Sub Son,Hans-Jürgen Stock, Su Sufrin, Weiqiang Sun, Pei Tang,Wim Tel, David Tien, Ashley Tilson,Ian Tolle,J.H. Tortai, Li-Shiuan Tsai, Stephen Tseng,Dieter Van den Heuvel, Maarten van Es,Luc van Kessel, Van Roey,Stanislav V. Verkhoturov, Alon Volfman, F Wang, Y. Wang, Wei Weintraub, R Willekers
openalex（2019）
引用0浏览0引用
0
0
Accuracy Optimization with Wavelength Tunability in Overlay Imaging Technology
Honggoo Lee, Yoonshik Kang, Sangjoon Han, Kyuchan Shim,Minhyung Hong,Seungyoung Kim,Jieun Lee,Dongyoung Lee, Eungryonh Oh,Ahlin Choi,Youngsik Kim,Tal Marciano,Dana Klein,Eitan M. Hajaj,Sharon Aharon,Guy Ben-Dov, Saltoun Lilach, Dan Serero,Anna Golotsvan
Metrology, Inspection, and Process Control for Microlithography XXXII (2018)
引用3浏览0引用
3
0
Impact of Stochastic Process Variations on Overlay Mark Fidelity Towards the 5 Nm Node
Mike Adel,Roel Gronheid,Chris Mack,Philippe Leray, Evgeni Gurevich,Bart Baudemprez, Dieter Vandenheuvel,Antonio Mani,Sharon Aharon,Dana Klein,Jungtae Lee,Mark D. Smith
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2017)
引用4浏览0引用
4
0
Accuracy in optical overlay metrology
Barak Bringoltz,Tal Marciano,Tal Yaziv,Yaron DeLeeuw,Dana Klein,Yoel Feler,Ido Adam, Evgeni Gurevich, Noga Sella, Ze’ev Lindenfeld,Tom Leviant, Lilach Saltoun, Eltsafon Ashwal, Dror Alumot,Yuval Lamhot,Xindong Gao,James Manka, Bryan Chen,Mark Wagner
Proceedings of SPIE（2016）
引用20浏览0引用
20
0
Qmerit-calibrated overlay to improve overlay accuracy and device performance
Md Zakir Ullah, Mohamed Fazly Mohamed Jazim, Stella Sim,Alan Lim, Biow Hiem, Lieu Chia Chuen, Jesline Ang, Ek Chow Lim,Dana Klein,Eran Amit, Roie Volkovitch,David Tien,Dongsub Choi
Proceedings of SPIE（2015）
引用1浏览0引用
1
0
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作者统计

#Papers: 17

#Citation: 183

H-Index: 8

G-Index: 13

Sociability: 5

Diversity: 1

Activity: 0

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