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论文共 16 篇作者统计合作学者相似作者

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Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing
Ik-Hyun Jeong, SeungWoo Koo,Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim,Jae-Wuk Ju,Kang-San Lee,Young-Sik Kim,Cees Lambregts, Rizvi Rahman,Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu,Paul Bocker, Dong-hak Lee, In-Ho Joo
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
引用0浏览0引用
0
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Scanner and Etch Co-Optimized Corrections for Better Overlay and CD Control
Ik-Hyun Jeong, Seung-Woo Koo,Hyun-Sok Kim,Jae-Wuk Ju,Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim,Katja Viatkina, Tom van Hemert, Ruud de Wit,David Deckers,Owen Chen,Nang-Lyeom Oh,Marcus Musselman, Marcus Carbery,Ssuwei Chen, Lucian Schmidt, Heidi Kwon, Jae Gyoo Lee
ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VIII (2019)
引用0浏览0引用
0
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Accuracy Optimization with Wavelength Tunability in Overlay Imaging Technology
Honggoo Lee, Yoonshik Kang, Sangjoon Han, Kyuchan Shim,Minhyung Hong,Seungyoung Kim,Jieun Lee,Dongyoung Lee, Eungryonh Oh,Ahlin Choi,Youngsik Kim,Tal Marciano,Dana Klein,Eitan M. Hajaj,Sharon Aharon,Guy Ben-Dov, Saltoun Lilach, Dan Serero,Anna Golotsvan
Metrology, Inspection, and Process Control for Microlithography XXXII (2018)
引用3浏览0引用
3
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作者统计

#Papers: 16

#Citation: 53

H-Index: 4

G-Index: 6

Sociability: 5

Diversity: 1

Activity: 0

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