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论文共 16 篇作者统计合作学者相似作者
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Lawrence S. Melvin,Wolfgang Demmerle, Joachim Siebert, Phil Stopford,Sergey Zavadskiy, Renato Hentschke, Krishna Ramkumar, Sylvain Berthiaume,Yudhishthir Kandel, Wolfgang Hoppe,Ulrich Klostermann,Zachary A. Levinson,Hans-Jürgen Stock,Ulrich Welling
DTCO and Computational Patterning II (2023)
openalex(2023)
Jongsu Kim, Hyekyoung Jue,Hyungju Ryu,Sang-Jin Kim,Joon-Soo Park, Kyoungsub Shin,Ulrich Welling, Jürgen Preuninger,Ulrich Klostermann,Hans-Jürgen Stock,Wolfgang Demmerle,Eun-Soo Jeong, Sang-Yil Chang,Jung-Hoe Choi
Extreme Ultraviolet (EUV) Lithography XI (2020)
Shimon Levi, Ishai Schwarzban, Angela Karvtsov, Matan Tobayas,Hans-Jurgen Stock,Thomas Muelders,Sean Hand,Jason Osborne
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIII (2019)
Cong Que Dinh,Seiji Nagahara,Gousuke Shiraishi,Yukie Minekawa,Yuya Kamei,Michael Carcasi,Hiroyuki Ide,Yoshihiro Kondo,Yuichi Yoshida,Kosuke Yoshihara,Ryo Shimada,Masaru Tomono,Teruhiko Moriya,Kazuhiro Takeshita,Kathleen Nafus,Serge Biesemans,John S. Petersen,Danilo De Simone,Philippe Foubert,Peter De Bisschop,Geert Vandenberghe,Hans-Jurgen Stock,Balint Meliorisz
Extreme Ultraviolet (EUV) Lithography X (2019): 350-359
Eran Amit,Jason Arjavac, P.R. Atkins, Angela Brett,Brian M. Barnes, Norman Birnstein, Sergey M. Borisov,Sascha Brose, V. Brouzet,Stefan Buhl,Benjamin Bunday,Sven Burger, Hsien-Hung Chang,Jun‐Dong Chang, Nick Chang, Alon Chen,Kai-Hsiung Chen, Cheng Zhang, Chu-Han Chiu,Kevin Chou, Hung‐Kuo Chu,James Clarke, Avi J. Cohen, Andrew Cross, Den Boef, S Desmoulins,Christophe Dezauzier, Alain C. Diebold, Hideto Dohi,J. Ducotè, Albrecht Eberle,Martin Ebert, Mark G. Eller,Fang Wei, Hans Fritz,Andreas Frommhold, L. I. Gershteǐn, Eva Giannatou,Sven Glabisch,Anna Golotsvan, V Gredy, Charles Hagen, Reza Hajiahmadi, S. Hayashi,Mark-Alexander Henn,Jan Hermans, Akiko Hirai, Katsumi Hirose, Ho‐Han Hsu, Kwang-Young Hu, Guo Cai Huang, Shang‐Yu Huang, T.J. Huisman, Joey Hunsche, Jisung Hwang,Ishikawa Masayoshi,Izawa Masayuki, J. Simon Tony, Kai Kal, Nora N. Kammer, Angela Karvtsov, N Kaufmann, Hideyuki Kazumi,Anne Kenslea, Robert S. Kern, Mehdi Kessar, Sasan Keyvani,T Kiers, Jin‐Hoi Kim, Wansoo Kim, Young‐Seok Kim, Grigory Klebanov,Dana Klein,Sung-Woo Ko, Richard Kris, P. Kruit, Stefan Kuiper,Stéphane Larivière, Le Lazzarino, Delphine Le Cunff, L Lecarpentier, Brian Lee, D. A. Lee,D.S. Lee,Ho-Se Lee, Julie Lee, Jun Lei,Bertrand Le-Gratiet, Patrick Lemaire,Shimon Levi, Susan R. Levy, John C. Lin, Yu‐Ju Lin,Rex Liu,Gian F. Lorusso, Hsiang-Lan Lung,Lu‐Fang Ma,Ruben Maas,Chris A. Mack, Jan Willem Maes,Antonio Mani,Ming Mao,Gino Marcuccilli, Melvin Mathew, T. McDaniel, Olivier Mermet, Robert Michels,A Mili,Matthieu Milléquant,Milo Renan, Hiroshi Miroku, A. Moussa, Ingrid Müller,Victoria Naipak, Dan Nelson, Duyen Thi Cam Nguyen, Nishihata Noifeld, Ondřej Novák, Ankush Oberai,Nang-Lyeom Oh, Bryan Orf, Jason W. Osborne,Alain Ostrovsky,Shyh-Shii Pai,Chan-Ha Park, Chris Park,Shin-Woong Park,Anne Pastol, Svetlana Pastur, Oliver D. Patterson, Carlos A. Pereira, Jeffrey L. Peters, C. R. M. Prentice, Jie Zhang,Ivo W. Rangelow, Ao Ren,Christoph Reuter,John Robinson,Justin Roller,Vito Rutigliani, E. A. Schweikert,Shahrjerdy Mir,Yoshiki Shiba,Yong Kong Siew, Richard T. Silver,Aileen Soco, Ewa Sommer, Hyung-Sub Son,Hans-Jürgen Stock, Su Sufrin, Weiqiang Sun, Pei Tang,Wim Tel, David Tien, Ashley Tilson,Ian Tolle,J.H. Tortai, Li-Shiuan Tsai, Stephen Tseng,Dieter Van den Heuvel, Maarten van Es,Luc van Kessel, Van Roey,Stanislav V. Verkhoturov, Alon Volfman, F Wang, Y. Wang, Wei Weintraub, R Willekers
openalex(2019)
Advances in Patterning Materials and Processes XXXV (2018)
Seiji Nagahara,Michael Carcasi,Gosuke Shiraishi,Hisashi Nakagawa,Satoshi Dei,Takahiro Shiozawa,Kathleen Nafus,Danilo De Simone,Geert Vandenberghe,Hans-Jurgen Stock,Bernd Kuchler,Masafumi Hori,Takehiko Naruoka,Tomoki Nagai,Yukie Minekawa,Tomohiro Iseki,Yoshihiro Kondo,Kosuke Yoshihara,Yuya Kamei,Masaru Tomono,Ryo Shimada,Serge Biesemans,Hideo Nakashima,Philippe Foubert,Elizabeth Buitrago,Michaela Vockenhuber,Yasin Ekinci,Akihiro Oshima,Seiichi Tagawa
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作者统计
#Papers: 16
#Citation: 62
H-Index: 4
G-Index: 7
Sociability: 5
Diversity: 1
Activity: 0
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