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论文共 57 篇作者统计合作学者相似作者

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Monolithic-CFET with Direct Backside Contact to Source/Drain and Backside Dielectric Isolation

A. Vandooren, K. Stiers, C. Sheng,C. Toledo de Carvalho Cavalcante,M. Hosseini,D. Batuk, A. Peng, X. Zhou,H. Mertens,A. Veloso, A. Mingardi, S. Sarkar Kumar, R. Kumar Saroj,K. D'havé,T. Chiarella,J. Bömmels,R. Loo,E. Rosseel,C. Porret, Y. Shimura, A. Akula,S. Choudhury,V. Brissonneau,E. Dupuy, T. Sarkar,A. Peter,N. Jourdan,J.P. Soulie,K. Vandersmissen,S. Iacovo,D. Montero,E. Vrancken,F. Sebaai,P. Puttarame Gowda, K. Lai,N. Buccheri,P. Matagne,B. T. Chan, A. Sepulveda Marquez,R. Langer, I. Gyo Koo,E. Altamirano Sanchez,K. Devriendt,F. Lazzarino,J. Mitard,J. Geypen,E. Grieten, Y-F. Chen, F. Verbeek, H. Pollenus,J. Heijlen,L.P.B. Lima,F. Holsteyns, S. Subramanian,N. Horiguchi,S. Demuynck,S. Biesemans

2024 IEEE International Electron Devices Meeting (IEDM)pp.1-4, (2024)

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Monolithic Complementary Field Effect Transistors (CFET) Demonstrated Using Middle Dielectric Isolation and Stacked Contacts

Steven Demuynck,Victor Vega-Gonzalez,C. Toledo de Carvalho Cavalcante,L. Petersen Barbosa Lima, K. Stiers, C. Sheng,A. Vandooren,M. Hosseini, X. Zhou,Hans Mertens,Thomas Chiarella,Jürgen Bömmels,Roger Loo,E. Rosseel,Clement Porret, Y. Shimura, A. Akula,G. Mannaert,S. Choudhury,V. Brissonneau,E. Dupuy, T. Sarkar,Nathali Franchina-Vergel,A. Peter,Nicolas Jourdan,J. P. Soulie,Kevin Vandersmissen,F. Sebaai,P. Puttarame Gowda, K. Lai, A. Mingardi, S. Sumar Sarkar,K. D'Have,B. T. Chan, A. Sepulveda Marquez,R. Langer, I. Gyo Koo,E. Altamirano Sanchez,Katia Devriendt, P. Rincon Delgadillo,F. Lazzarino,Jérôme Mitard,J. Geypen,E. Grieten,D. Batuk, Y.-F. Chen, F. Verbeek,F. Holsteyns,S. Subramanian,N. Horiguchi,S. Biesemans

Symposium on VLSI Technologypp.1-2, (2024)

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Comparative Analysis of Middle Dielectric Isolation (MDI) Integration Approaches in Monolithic Complementary Field Effect Transistors: ‘Mdi-First Vs MDI-Last’

Camila Toledo de Carvalho Cavalcante,Steven Demuynck,Alfonso Sepulveda Marquez, Maria Chistiakova, Subhobroto Choudhury,Geert Mannaert,Farid Sebaai, Maryam Hosseini,Anne Vandooren,Pallavi Puttarame Gowda,Emmanuel Dupuy,BT Chan,Hans Mertens,Jef Geypen,Sujith Subramanian, Lucas Petersen Barbosa Lima,Serge Biesemans,Naoto Horiguchi

Extended Abstracts of the 2024 International Conference on Solid State Devices and Materials (2024)

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Front-side Integration of Middle-of-line Stacked Contacts for Monolithic CFET

V. Vega-Gonzalez, K. Stiers, C. Sheng,S. Demuynck,C Toledo de Carvalho Cavalcante, L. Petersen,T. Chiarella,J. Boemmels, T. Sarkar, N. Franchina Vergel,D. Radisic,R. Loo,E. Rosseel,C. Porret,G. Mannaert,S. Choudhury,V. Brissonneau,E. Dupuy,A. Peter,N. Jourdan,J-P. Soulié,T. Hakamata, A. Romo-Negreira,R. Clark,K. Vandersmissen,F. Sebaai,P. Puttarame Gowda, J.G. Lai, A. Mingardi, S. Kumar Sarkar,B. T. Chan, A. Sepulveda Marquez,R. Langer, I. Gyo Koo,E. Altamirano Sanchez,K. Devriendt, P. Rincon Delgadillo,F. Lazzarino,J. Mitard,J. Geypen,D. Batuk, Y-F. Chen, F. Verbeeck,F. Holsteyns,S. Subramanian,Zs. Tőkei,N. Horiguchi,S. Biesemans

2024 IEEE International Interconnect Technology Conference (IITC)pp.1-3, (2024)

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Source-Drain Damage of Monolithic Complementary Field Effect Transistors: A Comprehensive Study of Failure Modes and Mitigation Strategies

Camila Toledo de Carvalho Cavalcante,Steven Demuynck,Emmanuel Dupuy,Thomas Chiarella,BT Chan,Pallavi Puttarame Gowda, Il Gyo Koo,Hans Mertens,Anne Vandooren,Farid Sebaai,Jef Geypen,Sujith Subramanian, Lucas Petersen Barbosa Lima,Serge Biesemans,Naoto Horiguchi

Extended Abstracts of the 2024 International Conference on Solid State Devices and Materials (2024)

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Assessment of STI Dry Etch Process Variability by Means of Dynamic Time Warping Technique

Alexey P. Milenin,B. T. Chan,Frederic Lazzarino

JAPANESE JOURNAL OF APPLIED PHYSICSno. SI (2023)

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Demonstration of Cavity Capacitor for Advanced Nanosheet Gate Stack Study

Camila Cavalcante,H. Arimura,Y. Oniki,F. Sebaai,E. Capogreco,L-A. Ragnarsson,B.T. Chan,A. Hikavyy,H. Mertens,K. Vandersmissen,E. Dentoni Litta,S. Subramanian,S. Biesemans,N. Horiguchi

Extended Abstracts of the 2023 International Conference on Solid State Devices and Materials (2023)

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Molybdenum Nitride As a Scalable and Thermally Stable Pwfm for CFET

Hiroaki Arimura,S. Brus,Jacopo Franco,Y. Oniki,A. Vandooren,T. Conard,B. T. Chan, B. Kannan, M. Samiee, W. Li, P. Deminskyi,E. Shero, J. Bakke,N. Jourdan,G. Alessio Verni,J. W. Maes,M. Givens,Lars-Åke Ragnarsson,Jérôme Mitard,E. Dentoni Litta,N. Horiguchi

2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (2023)

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Challenges for Spacer and Source/drain Cavity Patterning in CFET Devices

Geert Mannaert,Hans Mertens, Maryam Hosseini,Steven Demuynck, Vy Thi Hoang Nguyen,B.T. Chan,Frédéric Lazzarino

Advanced Etch Technology and Process Integration for Nanopatterning XII (2023)

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Integration of a Stacked Contact MOL for Monolithic CFET

Victor Vega-Gonzalez,D. Radisic,Bt Chan,S. Choudhury, S. Wang, A. Mingardi, Q. Toan Le, H. Decoster,Y. Oniki, P. Puttarame,Kevin Vandersmissen,J. P. Soulie,A. Peter,A. Sepulveda,D. Batuk,G. T. Martinez,Olivier Richard,Jürgen Bömmels,S. Biesemans,E. Dentoni Litta,Naoto Horiguchi, S. Park,Zsolt Tokei

2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (2023)

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