研究兴趣

论文共 20 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Roughness Improvement by Post-Development Treatment of CAR for High-Na EUV Lithography
Kayoko Cho, Hikari Tomori,Cong Que Dinh, Seiji Nagahara,Arisa Hara,Seiji Fujimoto,Arnaud Dauendorffer,Lior Huli,Kanzo Kato,Nathan Antonovich, Makoto Muramatsu
Advances in Patterning Materials and Processes XLI (2024)
引用0浏览0引用
0
0
Latest Advances in EUV Patterning for Preparation of High Numerical Aperture EUV
Soichiro Okada, Arnaud Dauendrffer,Yuhei Kuwahara,Cong Que Dinh, Ken Ando, Atsushi Tsuboi,Kathleen Nafus, Nobuyuki Fukui,Philippe Foubert,Danilo D. Simone
Advances in Patterning Materials and Processes XLI (2024)
引用0浏览0引用
0
0
Holistic litho-etch approach towards high NA EUV challenges
Soichiro Okada,Arnaud Dauendorffer,Yuhei Kuwahara,Satoru Shimura,Philippe Foubert,Danilo De Simone,Cong Que Dinh, Ken Ando, Atsushi Tsuboi, Nobuyuki Fukui,Arame Thiam,Yannick Feurprier,Kathleen Nafus
International Conference on Extreme Ultraviolet Lithography 2023 (2023)
引用0浏览0引用
0
0
Advanced development for contact-holes of metal-oxide resists
Cong Que Dinh,Seiji Nagahara,Kanzo Kato,Shinichiro Kawakami,Yuhei Kuwahara,Soichiro Okada, Kayoko Cho, Hikari Tomori, Junji Nakamura, Shoichi Terada,Makoto Muramatsu,Alexandra Krawicz, Kathleen McInerney,Nathan Antonovich,Lior Huli
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
引用0浏览0引用
0
0
加载更多
作者统计

#Papers: 20

#Citation: 46

H-Index: 4

G-Index: 6

Sociability: 4

Diversity: 1

Activity: 0

  • 合作者
  • 学生
  • 导师
暂无相似学者，你可以通过学者研究领域进行搜索筛选
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn