基本信息
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Career Trajectory
Bio
David H. Altman received the B.S. and M.S. degrees from Rensselaer Polytechnic Institute, New York, NY, and Boston University, Boston, MA.
He is a Principal Engineer with Raytheon Integrated Defense Systems Advanced Technology Programs Directorate, Sudbury, MA. His work focuses on research and development into thermal management and energy system technologies for next generation defense electronics. His current research interests include the development of advanced device scale, heat spreader, thermal interface, cold plate and cooling system technology incorporating emergent materials, and system concepts.
Research Interests
Papers共 35 篇Author StatisticsCo-AuthorSimilar Experts
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2022 21st IEEE Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems (iTherm)pp.1-7, (2022)
David Squiller,Pradeep Lall,Peter Sakalaukus,Shantanu Deshpande,Junchao Wei,Jungwan Cho, Pane Chao,Craig McGray,David Altman,Matthew Tyhach,Samuel Kim,James McClymonds,Samuel Graham,Kenneth Goodson,Daniel Francis, Felix Ejackman,Firooz Faili,Joe Dodson,Daniel Twitchen
2021 20th IEEE Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems (iTherm) (2021)
Journal of electronic packagingno. 4 (2019)
Dustin Kendig,Georges Pavlidis,Samuel Graham,Justin Reiter, Michael Gurr,David H. Altman, Stephen Huerster,Ali Shakouri
W Palko James,Lee Hyoungsoon, Chi Zhang,James Tom,Tanmoy Maitra,Yoonjin Won,D Agonafer Damena,M Clough Jess,Houshmand Farzad,Rong Guoguang,D Wilbur Joshua, Derrick Rockosi,Mykyta Ihor, Resler Dan,Altman David,Mehdi Asheghi,G Santiago Juan,E Goodson Kenneth
Advanced functional materialsno. 45 (2017): 201703265
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James W. Palko,Hyoungsoon Lee,Damena D. Agonafer,Chi Zhang,Ki Wook Jung,Jess Moss,Joshua D. Wilbur,Tom J. Dusseault,Michael T. Barako,Farzad Houshmand,Guoguang Rong,Tanmoy Maitra,Catherine Gorle,Yoonjin Won, Derrick Rockosi,Ihor Mykyta, Dan Resler,David Altman,Mehdi Asheghi,Juan G. Santiago,Kenneth E. Goodson
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Author Statistics
#Papers: 35
#Citation: 940
H-Index: 20
G-Index: 29
Sociability: 5
Diversity: 1
Activity: 1
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