Penumatcha Ashish Verma - Intel Corporation, Components Research

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Bio

Ashish V. Penumatcha received the B.Tech. degree in electrical and communication engineering from the National Institute of Technology, Jamshedpur, India, in 2005, and the M.S. degree in electrical and computer engineering from Purdue University, West Lafayette, IN, USA, in 2011, where he is currently pursuing the Ph.D. degree in electrical and computer engineering. He was an Intern with the Carbon Nanotechnology Group, IBM T. J. Watson Research Center, Yorktown Heights, NY, USA, in 2014. His current research interests include spintronics and low-dimensional materials for nanoelectronic applications. Mr. Penumatcha was a recipient of the IBM Ph.D. Fellowship Award in 2014.

Research Interests

Papers共 24 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选

Ultra-High-k Ferroelectric BaTiO3 Perovskite in the Gate Stack for Two-Dimensional WSe2 P-Type High-Performance Transistors

Punyashloka Debashis, Hojoon Ryu, Rachel Steinhardt,Pratyush Buragohain,John J Plombon,Kirby Maxey,Kevin P O'Brien,Raseong Kim,Arnab Sen Gupta,Carly Rogan, Jennifer Lux,I-Cheng Tung,Dominique Adams, Melisa Gulseren,Ashish Verma Penumatcha,Shriram Shivaraman,Hai Li, Ting Zhong, Shane Harlson,Tristan Tronic,Adedapo Oni, Steve Putna,Scott B Clendenning,Matthew Metz,Marko Radosavljevic,Uygar Avci,Ian A Young

Nano lettersno. 40 (2024): 12353-12360

Cited0Views0WOSBibtex

Record Performance in GAA 2D NMOS and PMOS Using Monolayer MoS2 and WSe2 with Scaled Contact and Gate Length

W. Mortelmans, P. Buragohain, C. Rogan, A. Kitamura, C. J. Dorow,K. P. O'Brien,R. Ramamurthy, J. Lux, T. Zhong, S. Harlson, E. Gillispie, T. Wilson,Adedapo Oni,A. Penumatcha, M. S. Kavrik,K. Maxey, A. Kozhakhmetov, C. C. Lin, S. Lee, A. Vyatskikh,N. Arefin, P. Fischer, J. Kevek,T. Tronic, M. Metz, S. B. Clendenning,U. Avci

Symposium on VLSI Technologypp.1-2, (2024)

Cited0Views0EIWOSBibtex

High Mobility TMD NMOS and PMOS Transistors and GAA Architecture for Ultimate CMOS Scaling

A. Penumatcha,K. P. O’Brien,K. Maxey, W. Mortelmans, R. Steinhardt, S. Dutta,C. J. Dorow, C. H. Naylor A., Kitamura Kitamura, T. Zhong,T. Tronic, P. Buragohain,C. Rogan, C-C. Lin, M. Kavrik, J. Lux,A. Oni, A. Vyatskikh,S. Lee,N. Arefin, P. Fischer, S. Clenndenning,M. Radosavljevic,M. Metz,U. Avci

2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)

Cited0Views0EIWOSBibtex

Process Integration and Future Outlook of 2D Transistors

Kevin P. O’Brien,Carl H. Naylor,Chelsey Dorow,Kirby Maxey,Ashish Verma Penumatcha,Andrey Vyatskikh, Ting Zhong,Ande Kitamura,Sudarat Lee,Carly Rogan,Wouter Mortelmans, Mahmut Sami Kavrik, Rachel Steinhardt,Pratyush Buragohain,Sourav Dutta,Tristan Tronic,Scott Clendenning,Paul Fischer, Ernisse S. Putna,Marko Radosavljevic, Matt Metz,Uygar Avci

Nature Communicationsno. 1 (2023)

Cited1Views0WOSNATUREBibtex

Exploring Manufacturability of Novel 2D Channel Materials: 300 Mm Wafer-Scale 2D NMOS & PMOS Using MoS2, WS2, & WSe2

C. J. Dorow,T. Schram,Q. Smets,K. P. O’Brien,K. Maxey, C.-C. Lin,L. Panarella,B. Kaczer,N. Arefin, A. Roy, R. Jordan,A. Oni,A. Penumatcha,C. H. Naylor, M. Kavrik,D. Cott, B. Graven,V. Afanasiev, P. Morin,I. Asselberghs, C. J. Lockhart de La Rosa,G. Sankar Kar,M. Metz,U. Avci

2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)

Cited0Views0EIWOSBibtex

Characterization and Closed-Form Modeling of Edge/Top/Hybrid Metal-2D Semiconductor Contacts

Arnab Pal, Varun Mishra, Justin Weber, Karthik Krishnaswamy, Krishnendu Ghosh,Ashish Verma Penumatcha,Salim Berrada, Kevin O'Brien,David Kencke,Kaustav Banerjee

2022 International Electron Devices Meeting (IEDM) (2022)

Cited2Views0EIWOSBibtex

Gate length scaling beyond Si: Mono-layer 2D Channel FETs Robust to Short Channel Effects

C. J. Dorow,A. Penumatcha, A. Kitamura,C. Rogan,K. P. O'Brien,S. Lee,R. Ramamurthy, C-Y Cheng,K. Maxey, T. Zhong,T. Tronic,B. Holybee, J. Richards,A. Oni,C-C Lin,C. H. Naylor,N. Arefin,M. Metz,R. Bristol,S. B. Clendenning,U. Avci

2022 INTERNATIONAL ELECTRON DEVICES MEETING, IEDMpp.7.5.1-7.5.4, (2022)

Cited3Views0EIWOSBibtex

Advancing Monolayer 2-D Nmos and Pmos Transistor Integration from Growth to Van Der Waals Interface Engineering for Ultimate CMOS Scaling

Chelsey Dorow,Kevin O'Brien,Carl H. Naylor,Sudarat Lee,Ashish Penumatcha, Andy Hsiao,Tristan Tronic,Michael Christenson,Kirby Maxey, Hui Zhu,Adedapo Oni, Urusa Alaan,Tanay Gosavi,Arnab Sen Gupta,Robert Bristol,Scott Clendenning,Matthew Metz,Uygar Avci

Symposium on VLSI Technology（2021）

Cited24Views0EIWOSBibtex

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