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论文共 54 篇作者统计合作学者相似作者

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From Lab to Fab: In-line SIMS for Process Control in Semiconductor Manufacturing
Stefan Schoeche, Katherine Sieg, Daniel Schmidt, Mohsen Nasseri,Shogo Mochizuki,Marinus Hopstaken, Yaguang Zhu, Li Xiang, Julia Hoffman, Daniel Lewellyn,Paul Isbester, Sarah Okada
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
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Backside Power Distribution for Nanosheet Technologies Beyond 2Nm
Ruilong Xie, Wonhyuk Hong, Chen Zhang, Jongjin Lee,Kevin Brew, Richard Johnson,Nicholas A. Lanzillo,Hosadurga Shobha, Taesun Kim, Panjae Park,Shogo Mochizuki,Iqbal Saraf,Chanro Park, Lei Zhuang, Clifford Osborn, Wai Kin Li, Feng Liu,Muthumanickam Sankarapandian, Chung Ju Yang, Juntao Li, Lukas Tierney,Ruturaj Pujari,Yasir Sulehria, Yuncheng Song, Huimei Zhou, Miaomiao Wang,Michael Belyansky, Somnath Ghosh, Haojun Zhang,Koichi Motoyama, Debarghya Sarkar, Wukang Kim, Albert Chu, Tao Li,Fabio Carta, Oleg Gluschenkov, Joongsuk Oh, Matthew Malley, Pinlei Chu, Son Nguyen, Katherine Luedders,Joe Lee, Shahrukh Khan, Prabudhya Roy Chowdhury, Huai Huang, Abir Shadman,Stuart Sieg, Daniel Dechene,Daniel Edelstein, John Arnold,Tenko Yamashita,Kisik Choi,Kang-ill Seo, Dechao Guo,Huiming Bu
Symposium on VLSI Technologypp.1-2, (2024)
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Improving FinFET Junctions and Contacts Via Laser Annealing
Oleg Gluschenkov,Yasir Sulehria,Shogo Mochizuki,Kevin Brew
2023 21st International Workshop on Junction Technology (IWJT)pp.1-4, (2023)
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Compressive Strained Si1-XGex Channel for High Performance Gate-All-Around Nanosheet Transistors
Shogo Mochizuki,Juntao Li, Erin Stuckert,Huimei Zhou,Nicolas Loubet
Meeting abstracts/Meeting abstracts (Electrochemical Society CD-ROM)no. 32 (2022): 1192-1192
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Precession Electron Diffraction (PED) Strain Characterization in Stacked Nanosheet FET Structure
J. Li,S. Mochizuki, E. Stuckert,L. Tierney, K. Toole, R. Conte,N. Loubet
International Symposium for Testing and Failure Analysis ISTFA 2022: Conference Proceedings from the 48th International Symposium for Testing and Failure Analysis (2022)
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Vertical-Transport Nanosheet Technology for CMOS Scaling Beyond Lateral-Transport Devices
H. Jagannathan,B. Anderson,C-W Sohn,G. Tsutsui,J. Strane,R. Xie,S. Fan,K- Kim,S. Song,S. Sieg,I Seshadri,S. Mochizuki,J. Wang,A. Rahman, K-Y Cheon,I Hwang,J. Demarest,J. Do, J. Fullam, G. Jo, B. Hong,Y. Jung, M. Kim, S. Kim, R. Lallement,T. Levin, J. Li,E. Miller, P. Montanini,R. Pujari, C. Osborn,M. Sankarapandian,G-H Son,C. Waskiewicz,H. Wu,J. Yim, A. Young,C. Zhang, A. Varghese,R. Robison,S. Burns, K. Zhao, T. Yamashita,D. Dechene,D. Guo,R. Divakaruni,T. Wu,K- Seo,H. Bu
2021 IEEE International Electron Devices Meeting (IEDM) (2021)
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作者统计

#Papers: 54

#Citation: 1210

H-Index: 15

G-Index: 34

Sociability: 6

Diversity: 2

Activity: 1

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