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论文共 12 篇作者统计合作学者相似作者

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High-K/Metal Gate MOSFETs における新しいレイアウト依存性

雅史濱口,Deleep R. Nair,D. Jaeger,尚志西村, W Li,M-H. Na,Christophe Bernicot, Joshua Liang,Knut Stahrenberg,K Kim,M. Eller,K-C. Lee,Takeshi Iwamoto,Y-W. Teh,貞之森,靖夫高須,Park Jh,Liyang Song, N-S. Kim,S. Kohler,H. Kothari, Jae‐Hoon Han, Shinichi Miyake,H. van Meer,F. Arnaud,K. Barla,M. Sherony,R. A. Donaton,M. Celik,桂宮下,V. Narayanan,R. Wachnik,M. Chudzik,J. Sudijono,Ku J.-H.,J D Kim,Makoto Sekine, Samuel Johnson,W. Neumueller,R. Sampson,E. Kaste,R. Divakaruni,史倫松岡

SIAM International Conference on Data Mining（2012）

引用22浏览0引用

High-K/Metal Gate MOSFETsにおける新しいレイアウト依存性(IEDM特集(先端CMOSデバイス・プロセス技術))

雅史濱口,Deleep R. Nair,D. Jaeger,尚志西村, W. Li,M-H. Na,Christophe Bernicot, Joshua Liang,Knut Stahrenberg, K. Kim,M. Eller,K-C. Lee,Takeshi Iwamoto,Y-W. Teh,貞之森,靖夫高須,Park Jh,Liyang Song, N-S. Kim,S. Kohler,H. Kothari, Jae‐Hoon Han, Shinichi Miyake,F. Arnaud,K. Barla,M. Sherony,R. A. Donaton,M. Celik,桂宮下,V. Narayanan,R. Wachnik,M. Chudzik,J. Sudijono,Makoto Sekine, Stephen C. Johnson,W. Neumueller,R. Sampson,E. Kaste,R. Divakaruni,史倫松岡

SIAM International Conference on Data Mining（2012）

引用23浏览0引用

New layout dependency in high-k/Metal Gate MOSFETs

M Hamaguchi,Deleep R Nair,D Jaeger,Hideo Nishimura, Wei Li,Mh Na,C Bernicot,Jing Liang, K Stahrenberg,Kyungmin Kim,M Eller,Kc Lee,Takeshi Iwamoto,Yw Teh,Seiichi Mori,Yoshio Takasu,Jong Hwan Park, Li Song,Ns Kim,S Kohler,H Kothari,Jp Han, Shogo Miyake,H V Meer,F Arnaud,K Barla,M Sherony,Ricardo A Donaton,Mehmet Celik,K Miyashita,Vijay Narayanan,R A Wachnik,Michael P Chudzik,J Sudijono,J H Ku, J D Kim,Makoto Sekine, Scott A Johnson,W Neumueller,R Sampson,E Kaste,R Divakaruni,F Matsuoka

Electron Devices Meetingpp.25.6.1-25.6.4, (2011)

引用6浏览0EIWOS引用

Cost Efficient Novel High Performance Analog Devices Integrated with Advanced HKMG Scheme for 28nm CMOS Technology and Beyond

J. P. Han,T. Shimizu,L. H. Pan,M. Voelker,C. Bernicot,F. Arnaud, A. C. Mocuta, K. Stahrenberg,A. Azuma, G. Yang,M. Eller,D. Jaeger,H. Zhuang,K. Miyashita,K. Stein, D. R. Nair,J. H. Park,M. Hamaguchi,S. Kohler,D. Chanemougame,W. Li, K. Kim,N. Kim, C. Wiedholz,S. Miyake,G. Tsutsui,H. van Meer, J. Liang, M. Ostermayr, J. Lian,M. Celik, R. Donaton,K. Barla,M. H. Na, Y. Goto,M. Sherony, F. Johnson,R. Wachnik,J. Sudijono,E. Kaste,R. Sampson,J.-H. Ku,A. Steegen,W. Neumueller

Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials（2010）

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Blanket SMT With In Situ N2 Plasma Treatment on the $\langle \hbox{100} \rangle$ Wafer for the Low-Cost Low-Power Technology Application

J. Yuan,Victor Chan,Nivo Rovedo,Viraj Y. Sardesai,Narasimhulu Kanike, V. Varadarajan, M. Yu,Jong Ho Yang, Y.K. Jeong,O.S. Kwon,M.P. Belyansky,M. Eller,Yong Meng Lee,N. Cave,Huiling Shang,Ying Li,R. Divakaruni

IEEE Electron Device Lettersno. 9 (2009): 916-918

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Blanket SMT With In Situ N2 Plasma Treatment on the $\langle \hbox{100} \rangle$ Wafer for the Low-Cost Low-Power Technology Application

Jun Yuan,V. Chan,N. Rovedo,V. Sardesai, N. Kanike, V. Varadarajan, M. Yu, Jong Ho Yang, Y.K. Jeong,O.S. Kwon,M.P. Belyansky,M. Eller, Yong Meng Lee,N. Cave, Huiling Shang, Ying Li,R. Divakaruni

IEEE Electron Device Lettersno. 9 (2009): 916-918

引用0浏览0引用

A 45nm Low Power Bulk Technology Featuring Carbon Co-Implantation And Laser Anneal On 45 Degrees-Rotated Substrate

J. Yuan,V. Chan,M. Eller,N. Rovedo,H. K. Lee, Y. Gao,V. Sardesai, N. Kanike,V. Vidya,O. Kwon,O. S. Kwon, J. Yan,S. Fang,W. Wille,H. Wang, Y. T. Chow,R. Booth, T. Kebede,W. Clark, H. Mo,C. Ryou, J. Liang, J. H. Yang,C. W. Lai, S. S. Naragad,O. Gluschenkov,M. R. Visokay,C. Radens,S. Deshpande,H. Shang, Y. Li,N. Cave,J. Sudijono,J. Ku,R. Divakaruni

2008 9TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1-4 (2008)

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High Performance Transistors Featured in an Aggressively Scaled 45nm Bulk Cmos Technology

Z. Luo,N. Rovedo,S. Ong,B. Phoong,M. Eller,H. Utomo,C. Ryou, H. Wang,R. Stierstorfer,L. Clevenger,S. Kim, J. Toomey, D. Sciacca,J. Li,W. Wille, L. Zhaol,L. Teo,T. Dyer,S. Fang, J. Yan,O. Kwon,D. Park,J. Holt, J. Han,V. Chan, J. Yuan, T. Kebede, H. Lee, S. Lee,A. Vayshenker,Z. Yang,C. Tian, H. Ng,H. Shang,M. Hierlemann,J. Ku, J. Sudijonol,M. Ieong

2007 IEEE Symposium on VLSI Technology（2007）

引用30浏览0EIWOS引用

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