Dexin Kong

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Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications

Steven Consiglio,Hisashi Higuchi,Takashi Ando,Paul C. Jamison,Soon-Cheon Seo,Dexin Kong,Youngseok Kim,Kandabara Tapily,Robert D. Clark,Marinus Hopstaken,Eduard A. Cartier, Tsunomura Takaaki,Cory Wajda, Robert Soave,Vijay Narayanan,Gert J. Leusink

Electrochemical Society Transactionsno. 2 (2021): 19-28

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Resistive Memory Process Optimization for High Resistance Switching Toward Scalable Analog Compute Technology for Deep Learning

Y. Kim,S-C Seo,S. Consiglio,P. Jamison, H. Higuchi,M. Rasch,E. Y. Wu,D. Kong,I Saraf,C. Catano,R. Muralidhar,S. Nguyen, S. DeVries,O. Van der Straten,M. Sankarapandian,R. N. Pujari,A. Gasasira, S. M. Mcdermott,H. Miyazoe, D. Koty, Q. Yang, H. Yan,R. Clark,K. Tapily,S. Engelmann, R. R. Robison,C. Wajda,A. Mosden,T. Tsunomura, R. Soave,N. Saulnier,W. Haensch,G. Leusink, P. Biolsi,V Narayanan,T. Ando

IEEE Electron Device Letters（2021）

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Introduction to Analog Testing of Resistive Random Access Memory (RRAM) Devices Towards Scalable Analog Compute Technology for Deep Learning

Ruturaj Pujari,Arthur Gasasira,Youngseok Kim,Veenadhar Katragadda,Soon-Cheon Seo,Dexin Kong, Xuefeng Liu,Sean Teehan,Nicole Saulnier,Ishtiaq Ahsan,Vijay Narayanan,Takashi Ando

2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)（2021）

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Bottom Electrode Properties and Electrical Field Cycling Effects on HfOx Based Resistive Switching Memory Device

J. Li,Y. Kim,D. Kong,K. Cheng,S. -C. Seo, C. Robinson,N. Saulnier, R. R. Robison, A. J. Varghese,I. Ahsan,R. Muralidhar,T. Ando,V. Narayanan

Proceedings - International Symposium for Testing and Failure Analysis (2020)

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Challenges in the Patterning of RRAM Devices for Analog Computing Applications (conference Presentation)

Iqbal Saraf,Shyam Sridhar,Christopher Catano,Sergey Voronin,Dexin Kong,Soon-Cheon Seo,Youngseok Kim,Takashi Ando,Nicole Saulnier,Vijay Narayanan

Advanced Etch Technology for Nanopatterning IX (2020)

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AFM Characterization for Gate-All-Around (GAA) Devices

Mary Breton,Jennifer Fullam,Dexin Kong,Daniel Schmidt,Andrew Greene,Julien Frougier,Sean Hand,Jason Osborne,Weijie Wang, David Fey

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV（2020）

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Measuring Local CD Uniformity in EUV Vias with Scatterometry and Machine Learning

Dexin Kong,Daniel Schmidt,Jennifer Church, Chi-Chun Liu,Mary A. Breton,Cody Murray,Eric Miller,Luciana Meli,John Sporre,Nelson Felix,Ishtiaq Ahsan,Aron J. Cepler,Marjorie Cheng,Roy Koret,Igor Turovets

Metrology, Inspection, and Process Control for Microlithography XXXIV (2020)

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Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology

Dexin Kong,Daniel Schmidt,Mary Breton,Abraham Arceo de la Pena,Julien Frougier,Andrew Greene,Jingyun Zhang,Veeraraghavan Basker,Nicolas Loubet,Ishtiaq Ahsan,Aron Cepler,Mark Klare,Marjorie Cheng,Roy Koret,Igor Turovets

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)（2020）

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Full Bottom Dielectric Isolation to Enable Stacked Nanosheet Transistor for Low Power and High Performance Applications

J. Zhang,J. Frougier,A. Greene,X. Miao,L. Yu,R. Vega, P. Montanini,C. Durfee,A. Gaul,S. Pancharatnam, C. Adams,H. Wu,H. Zhou,T. Shen,R. Xie,M. Sankarapandian,J. Wang,K. Watanabe,R. Bao, X. Liu, C. Park, H. Shobha,P. Joseph,D. Kong, A. Arceo De La Pena, J. Li,R. Conti,D. Dechene,N. Loubet,R. Chao,T. Yamashita,R. Robison,V. Basker, K. Zhao,D. Guo,B. Haran,R. Divakaruni,H. Bu

International Electron Devices Meeting（2019）

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论文共 17 篇作者统计合作学者相似作者