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个人简介
Babar A. Khan received the B.S., M.S., and Ph.D. degrees in electrical engineering from the Massachusetts Institute of Technology, Cambridge, MA, USA, in 1976, 1977, and 1984, respectively.
He was with Philips Research from 1984 to 1998, where his work included research on SOI films formed by laser and lamp recrystallization, polysilicon TFT displays, MOCVD of II-VI films, plasma addressed liquid crystal displays (LCDs), high-intensity discharge lamps formed by micromachining, and reflective LCDs on silicon. Since 1998, he has been with IBM Systems and Technology Group, Globalfoundries, Hopewell Junction, NY, USA, working on the development of embedded DRAM across multiple technology nodes, 7 nm FEOL and 3-D technology. His interests include device design, process development, process integration, product de-bugging, and product development.
研究兴趣
论文共 28 篇作者统计合作学者相似作者
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2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)pp.1-2, (2015)
N. Butt,K. Mcstay,A. Cestero,H. Ho,W. Kong,S. Fang,R. Krishnan,B. Khan, A. Tessier, W. Davies,S. Lee, Y. Zhang,J. Johnson, S. Rombawa,R. Takalkar,A. Blauberg,K. V. Hawkins, J. Liu,S. Rosenblatt,P. Goyal, S. Gupta,J. Ervin, Z. Li, S. Galis,J. Barth, M. Yin, T. Weaver, J. H. Li,S. Narasimha,P. Parries,W. K. Henson,N. Robson,T. Kirihata,M. Chudzik,E. Maciejewski,P. Agnello,S. Stiffler,S. S. Iyer
2010 INTERNATIONAL ELECTRON DEVICES MEETING - TECHNICAL DIGEST (2010)
Guodong Wang,D K Anand,Nauman Z Butt,Alberto Cestero,Michael P Chudzik, Joseph Ervin,S Fang,Gordon J Freeman,Howard Ho,Babar A Khan,Bumsoo Kim,W Kong,R Krishnan, Singhan T M Krishnan, Ohhyun Kwon,J Liu,Kevin Mcstay,Erik G Nelson, K Nummy,Paul C Parries,Jaewoong Sim,R Takalkar, Andre Tessier,Ravi M Todi,Riffat Naseem Malik,S R Stiffler,S S Iyer
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作者统计
#Papers: 28
#Citation: 652
H-Index: 17
G-Index: 25
Sociability: 5
Diversity: 2
Activity: 4
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