Tomofumi Fujimura

Tomofumi Fujimura was born in Yokohama, Japan, in 1981. He received the B.E. degree in electrical engineering from the University of Electro-Communications, Tokyo, Japan, in 2005, and the M.E. degree in electrical engineering from Tokyo Institute of Technology, Tokyo, Japan, in 2007. In 2007, he joined the Center for Semiconductor Research & Development, Toshiba Corporation, Yokohama, Japan, where he has been working on the circuit design of NAND flash memories.