Kisik Choi

K. Choi received the B.S. and M.S. degrees in materials science and engineering from Seoul National University, Seoul, Korea, 1991 and 1993, respectively, and the Ph.D degree in electrical and computer engineering from Texas Tech University, Lubbock, in 2004. He was with the R&D Center, Hynix Semiconductor Inc., Ichon, Korea, from 1993 to 1999. He continued his research activities on high-$k$/metal gate for MOSFET devices at SEMATECH from 2004 to 2007. He has been with the IBM T. J. Watson Research Center since he joined the research team of GLOBALFOUNDRIES (formerly AMD) in 2007. His research focuses on the fundamental understanding of the issues related to high-$k$/metal gate processes and integrations, such as work function tuning and Tinv scaling for advanced CMOS devices. He has authored or coauthored more than 60 journal and conference papers in various research topics.