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Papers共 26 篇Author StatisticsCo-AuthorSimilar Experts
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Daniel Schmidt,Curtis Durfee,Shanti Pancharatnam,Manasa Medikonda,Andrew Greene,Julien Frougier,Aron Cepler, Gilad Belkin,Dror Shafir,Roy Koret, Roy Shtainman,Igor Turovets,Shay Wolfling
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021)
Metrology, Inspection, and Process Control for Microlithography XXXIV (2020)
Proceedings of SPIE (2019)
Metrology, Inspection, and Process Control for Microlithography XXXII (2018): 1058505
34th European Mask and Lithography Conference (2018)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2017)
Gangadhara Raja Muthinti,Nicolas Loubet,Robin Chao, Abraham A. de la Pena,Juntao Li,Michael A. Guillorn,Tenko Yamashita,Sivananda Kanakasabapathy,John Gaudiello,Aron J. Cepler,Matthew Sendelbach,Susan Emans,Shay Wolfling, Avon Ger,Daniel Kandel,Roy Koret,Wei Ti Lee,Peter Gin,Kevin Matney,Matthew Wormington
Anil Gunay-Demirkol,Efrain Altamirano Sanchez,Stephane Heraud,Stephane Godny,Anne-Laure Charley,Philippe Leray, Ronen Urenski,Oded Cohen,Igor Turovets,Shay Wolfling
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Author Statistics
#Papers: 26
#Citation: 217
H-Index: 8
G-Index: 14
Sociability: 5
Diversity: 2
Activity: 0
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