Donaton Ricardo A. - IMEC | 人才画像

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论文共 25 篇作者统计合作学者相似作者

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DT CAPACITOR WITH SILICIDE OUTER ELECTRODE AND/OR COMPRESSIVE STRESS LAYER, AND RELATED METHODS

Nicolas Breil,Ricardo A Donaton,Dong Hun Kang,Herbert L Ho,Rishikesh Krishnan

mag（2015）

引用22浏览0引用

Method and structure for gate height scaling with high-k/metal gate technology

Michael P Chudzik,Ricardo A Donaton,William K Henson,Yue Liang

mag（2012）

引用47浏览0引用

HYBRID BONDING INTERFACE FOR 3-DIMENSIONAL CHIP INTEGRATION

Karl W Barth,Ricardo A Donaton, Spyridon Galis,Kevin S Petrarca,Shahab Siddiqui

mag（2012）

引用97浏览0引用

High-K/Metal Gate MOSFETs における新しいレイアウト依存性

雅史濱口,Deleep R. Nair,D. Jaeger,尚志西村, W Li,M-H. Na,Christophe Bernicot, Joshua Liang,Knut Stahrenberg,K Kim,M. Eller,K-C. Lee,Takeshi Iwamoto,Y-W. Teh,貞之森,靖夫高須,Park Jh,Liyang Song, N-S. Kim,S. Kohler,H. Kothari, Jae‐Hoon Han, Shinichi Miyake,H. van Meer,F. Arnaud,K. Barla,M. Sherony,R. A. Donaton,M. Celik,桂宮下,V. Narayanan,R. Wachnik,M. Chudzik,J. Sudijono,Ku J.-H.,J D Kim,Makoto Sekine, Samuel Johnson,W. Neumueller,R. Sampson,E. Kaste,R. Divakaruni,史倫松岡

SIAM International Conference on Data Mining（2012）

引用22浏览0引用

High-K/Metal Gate MOSFETsにおける新しいレイアウト依存性(IEDM特集(先端CMOSデバイス・プロセス技術))

雅史濱口,Deleep R. Nair,D. Jaeger,尚志西村, W. Li,M-H. Na,Christophe Bernicot, Joshua Liang,Knut Stahrenberg, K. Kim,M. Eller,K-C. Lee,Takeshi Iwamoto,Y-W. Teh,貞之森,靖夫高須,Park Jh,Liyang Song, N-S. Kim,S. Kohler,H. Kothari, Jae‐Hoon Han, Shinichi Miyake,F. Arnaud,K. Barla,M. Sherony,R. A. Donaton,M. Celik,桂宮下,V. Narayanan,R. Wachnik,M. Chudzik,J. Sudijono,Makoto Sekine, Stephen C. Johnson,W. Neumueller,R. Sampson,E. Kaste,R. Divakaruni,史倫松岡

SIAM International Conference on Data Mining（2012）

引用23浏览0引用

A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications

S Krishnan,Uikun Kwon,Naim Moumen,Matthew W Stoker,Eric C T Harley,Stephen W Bedell,Deleep R Nair,B I Greene,William K Henson,M A H Chowdhury, D P Prakash,E Wu,Dimitri E Ioannou,E Cartier,M H Na,Seiji Inumiya,Kevin Mcstay,Lisa F Edge, Ryosuke Iijima,Jin Cai,Martin M Frank,M Hargrove,Di Guo,Andreas Kerber,Hemanth Jagannathan,T Ando, J R Shepard, Sohail M Siddiqui, Menghong Dai,H Bu,J Schaeffer,David A Jaeger,K Barla,Thomas A Wallner,S Uchimura, Yuanjen Lee,Gauri V Karve,Sufi Zafar, D Schepis,Yan Wang,Ricardo A Donaton,Sudesh Saroop,Pietro Montanini,Yong Liang,J H Stathis, R J Carter,R Pal,Vamsi Paruchuri, Hideki Yamasaki,Jh Lee,Martin Ostermayr,Jp Han, Y Hu,M Gribelyuk,D G Park, Xu Chen,Srikanth B Samavedam,Shreesh Narasimha,P Agnello, Manaswitha Khare,R Divakaruni,V L Narayanan,Michael P Chudzik

Electron Devices Meeting（2011）

引用124浏览0EIWOS引用

124

New layout dependency in high-k/Metal Gate MOSFETs

M Hamaguchi,Deleep R Nair,D Jaeger,Hideo Nishimura, Wei Li,Mh Na,C Bernicot,Jing Liang, K Stahrenberg,Kyungmin Kim,M Eller,Kc Lee,Takeshi Iwamoto,Yw Teh,Seiichi Mori,Yoshio Takasu,Jong Hwan Park, Li Song,Ns Kim,S Kohler,H Kothari,Jp Han, Shogo Miyake,H V Meer,F Arnaud,K Barla,M Sherony,Ricardo A Donaton,Mehmet Celik,K Miyashita,Vijay Narayanan,R A Wachnik,Michael P Chudzik,J Sudijono,J H Ku, J D Kim,Makoto Sekine, Scott A Johnson,W Neumueller,R Sampson,E Kaste,R Divakaruni,F Matsuoka

Electron Devices Meetingpp.25.6.1-25.6.4, (2011)

引用6浏览0EIWOS引用

CMOS structure including differential channel stressing layer compositions

Liu Yaocheng,Ricardo A Donaton,Kern Rim

mag（2011）

引用26浏览0引用

Novel High-Performance Analog Devices for Advanced Low-Power High-k Metal Gate Complementary Metal–Oxide–Semiconductor Technology

Japanese journal of applied physics（2011）

引用0浏览0引用

METHOD FOR REMOVING THRESHOLD VOLTAGE ADJUSTING LAYER WITH EXTERNAL ACID DIFFUSION PROCESS

Kuangjung Chen,Ricardo A Donaton,Wusong Huang,Waikin Li

mag（2010）

引用61浏览0引用

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