基本信息
浏览量:12
职业迁徙
个人简介
He has worked on fast plasma deposition technology, focusing on the fundamentals of both plasma, as well as on the surface processes occurring in plasma processing of materials. He specializes in applying new advanced diagnostics for gas phase species detection, as well as in situ analysis and control of the physical and chemical properties of the materials processed.
He has authored and coauthored more than 400 papers in peer-reviewed journals and is the coinventor of more than ten patents.,Prof. Sanden is a Fellow of AVS, IUPAC, and IOP, and serves on numerous scientific committees of international conferences.
研究兴趣
论文共 846 篇作者统计合作学者相似作者
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E. J. Devid,W. A. Bongers,P. W. C. Groen, M. van Ginkel,S. J. Doyle, F. M. A. Smits,C. F. A. M. van Deursen, K. Serras, S. Labeur,M. A. Gleeson,M. C. M. van de Sanden
Plasmano. 3 (2024): 566-584
crossref(2024)
Tiago Silva,Susanta Bera,Carlos D. Pintassilgo, Anja Herrmann,Stefan Welzel,Mihalis N. Tsampas,Mauritius C. M. van de Sanden, Luis L. Alves,Vasco Guerra
JOURNAL OF PHYSICAL CHEMISTRY Ano. 34 (2024): 7235-7256
Fuel (2023): 126734-126734
I Adamovich,S. Agarwal,E. Ahedo,L. L. Alves,S. Baalrud,N. Babaeva,A. Bogaerts,A. Bourdon,P. J. Bruggeman,C. Canal,E. H. Choi,S. Coulombe,Z. Donko,D. B. Graves, S. Hamaguchi,D. Hegemann,M. Hori,H-H Kim,G. M. W. Kroesen,M. J. Kushner,A. Laricchiuta,X. Li,T. E. Magin,S. Mededovic Thagard,V Miller, A. B. Murphy,G. S. Oehrlein,N. Puac,R. M. Sankaran,S. Samukawa,M. Shiratani,M. Simek,N. Tarasenko,K. Terashima,E. Thomas,J. Trieschmann,S. Tsikata,M. M. Turner,I. J. van der Walt,M. C. M. van de Sanden,T. von Woedtke
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作者统计
#Papers: 849
#Citation: 30751
H-Index: 76
G-Index: 137
Sociability: 7
Diversity: 3
Activity: 72
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