Jeroen Van De Kerkhove - IMEC | 人才画像

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论文共 21 篇作者统计合作学者相似作者

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EUV lithography: LER design, mask, and wafer impact

Jiahui Wang,Emily Gallagher,Darko Trivkovic,Rik Jonckheere,Jeroen Van de Kerkhove

Optical and EUV Nanolithography XXXVII (2024)

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Voltage Contrast Determination of Design Rules at the Limits of EUV Single Patterning

Victor M. Blanco Carballo,Etienne P. De Poortere,Philippe Leray,Dorin Cerbu,Jeroen van de Kerkhove, Nicola N. Kissoon

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 4 (2023)

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EUV Low-N Attenuated Phase-Shift Mask on Random Logic Via Single Patterning at Pitch 36Nm

Ling Ee Tan,Werner Gillijns,Jae Uk Lee,Dongbo Xu,Jeroen Van de Kerkhove,Vicky Philipsen,Ryoung-han Kim

Optical and EUV Nanolithography XXXV (2022)

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300 Mm Wafer Development for Pattern Collapse Evaluations

Xiu Mei Xu,Tao Zheng,Mohamed Saib,Farid Sebaai,Jeroen van de Kerkhove,Nandi Vrancken,Guy Vereecke,Frank Holsteyns

Solid State Phenomena（2018）

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CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)

Thomas Wallow, Chen Zhang,Anita Fumar-Pici,Jun Chen,Bart Laenens,Christopher A. Spence,David Rio,Paul van Adrichem,Harm Dillen, Jing Wang, Peng-Cheng Yang,Werner Gillijns,Patrick Jaenen,Frieda Van Roey,Jeroen Van de Kerkhove,Sergey A. Babin

Proceedings of SPIE（2017）

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Metal1 patterning study for random-logic applications with 193i, using calibrated OPC for litho and etch

Julien Mailfert,Jeroen Van De Kerkhove,Peter De Bisschop,Kristin De Meyer

Proceedings of SPIE（2014）

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OPC Resist Model Separability Validation after SMO Source Change

Werner Gillijns,Jeroen Van de Kerkhove,Darko Trivkovic,Peter De Bisschop,David Rio,Stephen Hsu,Mu Feng,Qiang Zhang,Hua-yu Liu

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2013）

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Measurement Technology to Quantify 2D Pattern Shape in Sub-2X Nm Advanced Lithography

Daisuke Fuchimoto,Hideo Sakai,Hiroyuki Shindo,Masayuki Izawa,Hitoshi Sugahara,Jeroen Van de Kerkhove,Peter De Bisschop

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2013）

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Model calibration and validation for pre-production EUVL

G F Lorusso,Jeroen Van De Kerkhove,Peter De Bisschop,Eric Hendrickx, J Jiang, David Del Rio, Wei Liu, Hui Liu

Proceedings of SPIE（2012）

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