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论文共 134 篇作者统计合作学者相似作者

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Low Landing Energy As an Enabler for Optimal Contour Based OPC Modeling in the EUV Era
Ran Alkoken, Mor Baram, Gadi Oron,Nivea Schuch,Frederic Robert,Thiago Figueiro, Omri Brand, Matan Geta, Kasturi Saha, Elias Miller, Tal Zavhon, Dipayan Tiwari, Deepakkumar Singh, Sujan Kumar Sarkar, Paulina Delgadillo,Gian Lorusso,Christophe Beral,Chih-I Wei, Gabriel Curvacho, Young Chang Kim,Germain Fenger
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
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Wafer-scale characterization for two-dimensional material layers
A. Moussa,J. Bogdanowicz,B. Groven,P. Morin, M. Beggiato,M. Saib, G. Santoro, Y. Abramovitz, K. Houchens, S. Ben Nissim, N. Meir,J. Hung, A. Urbanowicz,R. Koret,I. Turovets, B. Lee, W. T. Lee,G. F. Lorusso,A. -L. Charley
JAPANESE JOURNAL OF APPLIED PHYSICSno. 3 (2024)
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Frequency-informed Deep-Learning Denoising Method Supporting Sub-Nm Metrology for High NA EUV Lithography
Minjung Kim,Dorin Cerbu, Selim Dogru, Kumara Sastry,Gian Lorusso,Mohamed Zidan,Mohamed Saib,Joren Severi,Danilo De Simone, Vivek K. Singh
DTCO and Computational Patterning II (2023)
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Direct yield prediction from SEM images
Lilach Choona, Jasmine Linshiz, Shaul Pres, Boris Levant, Noam Tal,Gaetano Santoro,Sylvain Baudot, Ann Opdebeeck, Jason Reifsnider,Senthil Vadakupudhu Palayam,Gian Lorusso,Jerome Mitard, Shay Yogev
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Special Section Guest Editorial: Advances in E-Beam Metrology
Gian Francesco Lorusso,Chris A. Mack
Journal of Micro/Nanopatterning Materials and Metrologyno. 02 (2023)
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作者统计

#Papers: 137

#Citation: 1167

H-Index: 23

G-Index: 27

Sociability: 6

Diversity: 1

Activity: 2

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