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论文共 36 篇作者统计合作学者相似作者

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Residuals Reduction in Imaging-Based Overlay using Color per Layer
Katz Shlomit,Suk Won Park, Joonsang You,Hyunjun Kim,Honggoo Lee,Jungchan Kim,Dongyoung Lee, Hongbok Yeon,Joonseuk Lee,Sang-Ho Lee, Jae Wook Seo, Yehuda Dor, Junho Kim, Hongcheon Yang,Dohwa Lee,Nanglyeom Oh,Dongsub Choi,Wayne Zhou,Hedvi Spielberg,Ohad Bachar
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Large Field of View Metrology: Detecting critical Edge Placement Error signatures not seen with small Field of View in an HVM environment
Mohamed Ridane, Ivy Chen, Jaden Song,Peter Nikolsky, Kuan-Ming Chen, Shinyeong Lee,Sean Park,Kolos Lin,Yu-Chi Su,Kyoyeon Cho, Ethan Yu, James Park,Abdalmohsen Elmalk,Chih-Hung Hsieh,Alexander Serebryakov, Lei Zhang,Taekwon Jee, Joonsang You,Hong-Goo Lee, Jongmin Park,Jungchan Kim,Sang-Woo Kim,Seungmo Hong, Jaewook Seo
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Budgeting and Predicting Pattern Defects Using Edge Placement Error and Machine Learning
Taekwon Jee, Joonsang You,Hong-Goo Lee,Sang-Ho Lee,Seungmo Hong, Jaewook Seo,Roi Meir, Noam Oved, Jun Park, Shin-Ik Kim, Byung-Jo Lim,Chan-Hee Kwak,Jeong-Ho Yeo
2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM (2023)
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Statistical process optimization method for metrology equipment
Dongsoo Kim, Moran Zaberchik,Chen Li,Honggoo Lee,Chanha Park,Sang Ho Lee,Dongyoung Lee, Scott Beatty, Jae Young Park,Ramkumar Karur-Shanmugam, Telly Koffas,Dohwa Lee,Sanghuck Jeon,Dongsub Choi,Efi Megged, Nir BenDavid,Hedvi Spielberg
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 488-494
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作者统计

#Papers: 36

#Citation: 69

H-Index: 4

G-Index: 6

Sociability: 5

Diversity: 1

Activity: 0

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