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个人简介
G. Andrew “Andy” Antonelli received a BS in physics from Davidson College in 1995 and a MS and Ph.D. in physics from Brown University in 2002. He is the VP of Advanced R&D at Onto Innovation, Inc. His research has three areas of focus: (1) optical metrology especially using novel ultrafast laser, infrared, and ultraviolet sources, (2) synthesis and characterization of novel electronic materials, and (3) novel methods of device and process integration.
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论文共 84 篇作者统计合作学者相似作者
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Ezra Pasikatan,G. Andrew Antonelli,Nicholas Keller,Subhadeep Kal, Matthew Rednor, Markus Kuhn, Satoshi Murakami, Alain C. Diebold
Journal of Micro/Nanopatterning, Materials, and Metrologyno. 04 (2024)
Youcheng Wang, Zhuo Chen,Cong Wang,Nick Keller,G. Andrew Antonelli,Zhuan Liu,Troy Ribaudo, Rostislav Grynko
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURINGno. 3 (2024): 244-250
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
Nick Keller, Zhuo Chen, Peter Wang, Rostislav Grynko,Troy Ribaudo,G. Andrew Antonelli,Youcheng Wang,Joshua Frederick,Sadao Takabayashi, John Hauck,Dan Engelhard
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
Youcheng Wang, Zhuo Chen, Cong Wang,Nick Keller,G. Andrew Antonelli,Zhuan Liu,Troy Ribaudo, Rostislav Grynko
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-8, (2023)
Robin Mair,G. Andrew Antonelli,Manjusha Mehendale,Priya Mukundhan, Beth May,Karen Terry, Nathaniel Brandt, Xiaoyue Phillip Huang,Tong Zhao
2022 33RD ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC) (2022)
Nick Keller,Wenmei Ming, Zhuo Chen,G. Andrew Antonelli,Troy Ribaudo,Zhuan Liu,Sadao Takabayashi, John Hauck,Joshua Frederick,Dan Engelhard
Metrology, Inspection, and Process Control XXXVI (2022)
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作者统计
#Papers: 84
#Citation: 1689
H-Index: 25
G-Index: 37
Sociability: 5
Diversity: 2
Activity: 8
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