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Advanced FTIR Optical Modeling for Hydrogen Content Measurements in 3D NAND Cell Nitride and Amorphous Carbon Hard Mask
Joshua Frederick, Youcheng Wang, Haodong Qiu, Eui Sang Song, Sadao Takabayashi, Izaak Williamson, Ryan Lucas, Zhuo Chen, Peter Wang, Benoit Ravot, Hao Wang,Dan Engelhard
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
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Advanced Processing Control for Wafer-to-wafer Hybrid Bonding
Nikhil Aditya Kumar Roy, Richard Housley,Dan Engelhard, Hao Wang, Cassie Bayless, Chris Nguyen, Franz Zach, Shubham Badjate, Abhishek Gottipati, Grauer Yoav, Oren Ben-nun, Roie Volkovich
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
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Small Pitch Overlay Imaging Metrology Targets for Tight OPO Control
Nikhil Aditya Kumar Roy, Richard Housley, Suresh Kumar, Ranga Reddy,Dan Engelhard, Hao Wang, Atsushi Miyafuji, Toshiharu Nishiyama,Yoel Feler,Diana Shaphirov,Mark Ghinovker, Ido Ashuah,Yoav Grauer,Yonglei Li
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
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Characterization of Asymmetries in 3D NAND Memory Devices
Jie Li, Shashank Srivastava, Joyce Li, Zhuo Chen,Petar Zuvela, Boyang Chor, Jinyu Deng,Haodong Qiu, YaChing Chang,Sadao Takabayashi, Xadric Yiew, Bo Hui Ng, Rohit Kothari,Dan Engelhard, Han Yang Tan
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Ellipsometric Critical Dimension Metrology Employing Mid-Infrared Wavelengths for High-Aspect-ratio Channel Hole Module Etch Processes
George A. Antonelli,Nick Keller,Troy Ribaudo,Franklin J. Wong,Wenmei Ming, Hepeng Ding, Zhuo Chen, Ross Grynko, Ahmad Fumani,Zhuan Liu,Sadao Takabayashi, John Hauck,Joshua Frederick,Dan Engelhard, Bo Hui Ng, Biow Hiem Ong, Luey Chwan Liong
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021)
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作者统计

#Papers: 6

#Citation: 0

H-Index: 0

G-Index: 0

Sociability: 3

Diversity: 0

Activity: 0

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