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个人简介
Eric Hendrickx currently is R&D manager in the Advanced Patterning department at imec. He graduated from the University of Leuven in 1996. From 1996 to 2001 he was a postdoc at the University of Arizona (Optical Sciences Center) and the University of Leuven, developing dynamic holography. He joined imec in 2001 and worked on 193nm immersion and EUV lithography technology introduction. His current responsibilities include scanners, imaging, and photomasks.
研究兴趣
论文共 162 篇作者统计合作学者相似作者
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Rik Jonckheere,Tatiana Kovalevich,Vincent Wiaux,Vicky Philipsen,Eric Hendrickx,Andreas Verch, Maximillian Albert,Renzo Capelli
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
JAPANESE JOURNAL OF APPLIED PHYSICSno. 4 (2024)
Joost Bekaert, Balakumar Baskaran,Lieve Van Look,Joern-Holger Franke,Vicky Philipsen,Ardavan Niroomand,Eric Hendrickx, Hideaki Komami, Tatsuro Okawa,Soichi Shida, Shinichi Kojima,Toshimichi Iwai
39th European Mask and Lithography Conference (EMLC 2024) (2024)
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
Joost Bekaert,Emily Gallagher, Marina Y. Timmermans,Ivan Pollentier, Rik Jonckheere, Remko Aubert,Eric Hendrickx
Optical and EUV Nanolithography XXXVI (2023)
Optical and EUV Nanolithography XXXV (2022)
International Conference on Extreme Ultraviolet Lithography 2021 (2021)
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作者统计
#Papers: 164
#Citation: 2337
H-Index: 25
G-Index: 41
Sociability: 7
Diversity: 0
Activity: 0
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