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Journal of micro-nanopatterning, materials, and metrologyno. 04 (2023)
OPTICAL AND EUV NANOLITHOGRAPHY XXXV (2022)
Murali Emani,Zhen Xie,Siddhisanket Raskar,Varuni Sastry,William Arnold, Bruce Wilson,Rajeev Thakur,Venkatram Vishwanath,Zhengchun Liu,Michael E. Papka,Cindy Orozco Bohorquez, Rick Weisner, Karen Li,Yongning Sheng,Yun Du,Jian Zhang,Alexander Tsyplikhin,Gurdaman Khaira,Jeremy Fowers,Ramakrishnan Sivakumar, Victoria Godsoe,Adrian Macias,Chetan Tekur,Matthew Boyd
2022 IEEE/ACM INTERNATIONAL WORKSHOP ON PERFORMANCE MODELING, BENCHMARKING AND SIMULATION OF HIGH PERFORMANCE COMPUTER SYSTEMS (PMBS)pp.13-25, (2022)
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021)
Wei Chih-I,Wu Stewart, Yunfei Deng,Khaira Gurdaman,Kusnadi Ir,Fenger Germain,Kang Seulki, Yosuke Okamoto,Maruyama Kotaro, Yuichiro Yamazaki,Das S,Halder Sandip,Gillijns Werner,Lorusso Gian
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2021)
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EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII (2021)
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI (2020)
https://doi.org/10.1117/12.2538165 (2019)
Optical Microlithography XXXII (2019)
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#Papers: 28
#Citation: 646
H-Index: 13
G-Index: 21
Sociability: 5
Diversity: 2
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