Gaussian Random Field EUV Stochastic Models, Their Generalizations and Lithographically Meaningful Stochastic Metrics

Azat Latypov,Gurdaman Khaira,Germain Fenger,Shuling Wang,Marko Chew,Shumay Shang

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII（2021）

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关键词
EUV,lithography,resist,stochastic,Gaussian random field,reaction-diffusion process,SRAF printability,electrical conductance
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