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Demonstration of Poly Gate Cut Process at Tight Gate Pitch of 50nm and High Gates Aspect Ratio for Advanced Device Architectures

Xiuju Zhou, Zheng Tao,Hans Mertens,Emmanuel Dupuy,Anabela Veloso,Boon Teik Chan,Sujith Subramanian, Naoto Horiguchi,Serge Biesemans, Elisabeth Camerotto, Haseeb Kazi,Ziad El Otell

Extended Abstracts of the 2024 International Conference on Solid State Devices and Materials（2024）

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