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TCAD Simulation Study of Dual Ferroelectric Gate Field-Effect Transistors with a Recessed Channel Geometry for Non-Volatile Memory Applications

Simin Chen, Dae-Hwan Ahn,Seong Ui An, Tae Hyeon Noh,Younghyun Kim

Journal of the Korean Physical Society(2024)

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Key words
Ferroelectric FETs (FeFETs),Recessed channel,MFMIS
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