Enable In-Die Overlay Measurement on DRAM Storage Node by Line Scan Self-Calibration Method

June Yeh,Sam Tsai, Cheng An Lin, Cheng Wei Yang, Kai Ping Chan, Cheng Ta Cheng, Foster Huang, Henry Chen, Cheng-Hang Yang, York Yang, Peter Paquet,Houssam Chouaib,Zhengquan Tan

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII(2024)

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Key words
in-die overlay (IDO),machine learning,scatterometry,spectroscopic ellipsometry (SE),Mueller matrix,Confidence Index (CIndex),SpectraShape 11k
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