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32nm技術への応用用low-κ TDDBへのCoWP金属キャップの影響に関する包括的検討

F Chen,M. Shinosky,B. Li,C. Christiansen, T Lee,J. Aitken,D. Badami,E. Huang,Griselda Bonilla,Ko T.-M.,Terence Kane, Y Wang, M. Zaitz, Lee M. Nicholson,M. Angyal,Connie Truong, X Chen, Guifu Yang, S. B. Law,Teck Jung Tang,Sébastien Petitdidier,G. Ribes, M. Oh,Craig Child, H Sawada,A. Kolics, O Rigoutat, N Gilbert

International Reliability Physics Symposium（2010）

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