Demonstration of TFHM Scalability to 32 Nm Node BEOL Interconnect and Extendibility to ELK K ≤ 2.3 Dielectric MaterialK. Hamioud,V. Arnal,A. Farcy,V. Jousseaume,A. Zenasni,Olivier Gourhant,B. Icard,Jonathan Pradelles,S. Manakli,P. Brun,G. Imbert,C. Jayet,M. Assous,S. Maîtrejean,M. Vilmay,D. Galpin,C. Monget,J. Guillan,S. Chhun,E. Richard, D. Barbier,M. Haondopenalex（2009）引用 0|浏览1暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
