Mitigation of the Etch-Induced Intra-Field Overlay Contribution

Richard van Haren,Oktay Yildirim,Orion Mouraille,Leon van Dijk,Kaushik Kumar,Yannick Feurprier,Christiane Jehoul,Jan Hermans

ADVANCED ETCH TECHNOLOGY AND PROCESS INTEGRATION FOR NANOPATTERNING XI（2022）

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关键词

Overlay,On-product,Etch,Intra-field,Metrology to Device offset,Exposure field

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