Constructing a robust PSCAR (TM) process for EUV

Michael Carcasi,Seiji Nagahara,Gosuke Shiraishi,Yukie Minekawa,Hiroyuki Ide,Yoshihiro Kondo,Kosuke Yoshihara,Masaru Tomono,Ryo Shimada,Kazuhiro Takeshita,Teruhiko Moriya,Yuya Kamei,Kathleen Nafus,Serge Biesemans,Hideo Nakashima,Masafumi Hori,Ken Maruyama,Hisashi Nakagawa,Tomoki Nagai,Satoshi Dei,Masayuki Miyake,Takehiko Naruoka,Motoyuki Shima,Geert Vandenberghe,Danilo De Simone,Philippe Foubert,John S. Petersen,Akihiro Oshima,Seiichi Tagawa

Proceedings of SPIE（2018）

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关键词
Photosensitized Chemically Amplified Resist (TM),PSCAR (TM),sensitivity,resolution,LER,RLS trade-off
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