A Novel Low Temperature ( < 500 ° C ) and Low-κ ( 3 . 8 ) Boron Nitride PECVD Offset Spacer Featuring 3 D VLSI Integration

C.M.V. Lu, C. Bout,C. Fenouillet-Beranger,A. Roule, M.P. Samson, B. Previtali, C. Arvet, A. Michallet, N. Rochat, S. Favier, R. Kachtouli, V. Loup, P. Besson, M. Garcia-Barros, N. Posseme, F. Pierre, P. Maury, D. Benoit, P. Batude, M. Vinet, T. Skotnicki

Extended Abstracts of the 2015 International Conference on Solid State Devices and Materials（2015）

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