Complementary metal oxide semiconductor (CMOS) gate stack with high dielectric constant gate dielectric and integrated diffusion barrierN A Bojarczuk,Kevin K Chan,C Demic,Evgeni P Gousev,Supratik Guha,P Jamison,Larsake Ragnarssonmag（2005）引用 56|浏览2暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
