Yasutaka Ando

Yasutaka Ando was born in 1966 in Osaka, Japan. He received the B.Sc., M.Sc., and Ph.D. degrees from Osaka University, Osaka, in 1989, 1991, and 1998, respectively. He has been a Professor with the Department of Mechanical Engineering, Ashikaga Institute of Technology, Ashikaga, Japan, since 2010, where he joined as a Research Associate in 1998, and was an Associate Professor in 2001. His current research interests include chemical reaction of thermal plasma chemical vapor deposition (CVD) and physical property of films deposited by plasma spraying and thermal plasma CVD.