Taeyong Eom - Division of Advanced Materials, Korea Research Institute of Chemical Technology (KRICT)

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Direct Growth of Bi2SeO5 Thin Films for High-k Dielectrics Via Atomic Layer Deposition

Hyeonbin Park, Jae Hun Hwang,Seung Hoon Oh,Jin Joo Ryu,Kanghyeok Jeon,Minsoo Kang,Hyun-Jun Chai,Ayoung Ham,Gun Hwan Kim,Kibum Kang,Taeyong Eom

ACS NANOno. 33 (2024): 22071-22079

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Area-selective Atomic Layer Deposition on 2D Monolayer Lateral Superlattices

NATURE COMMUNICATIONS（2024）

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Purely Self-Rectifying Memristor-Based Passive Crossbar Array for Artificial Neural Network Accelerators

Kanghyeok Jeon,Jin Joo Ryu,Seongil Im,Hyun Kyu Seo,Taeyong Eom,Hyunsu Ju,Min Kyu Yang,Doo Seok Jeong,Gun Hwan Kim

NATURE COMMUNICATIONSno. 1 (2024)

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Evaluation of Tin Nitride (sn3n4) Via Atomic Layer Deposition Using Novel Volatile Sn Precursors

Hyeonbin Park,Heenang Choi,Sunyoung Shin,Bo Keun Park,Kibum Kang,Ji Yeon Ryu,Taeyong Eom,Taek-Mo Chung

DALTON TRANSACTIONSno. 41 (2023): 15033-15042

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Controlled Orientation and Microstructure of P-Type SnO Thin Film Transistors with High-K Dielectric for Improved Performance

Seung Ho Ryu,Jihoon Jeon,Gwang Min Park,Taikyu Kim,Taeyong Eom,Taek-Mo Chung,In-Hwan Baek,Seong Keun Kim

APPLIED PHYSICS LETTERSno. 7 (2023)

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Area-Selective Atomic Layer Deposition of SnS2 Nanosheets for Applications of Back-End-of-Line-Compatible Transistors

Jaegyun Yim,Hong Keun Chung,Seung Ho Ryu,Han Kim,Sung Ok Won,Taeyong Eom,Taek-Mo Chung,Seong Keun Kim

ACS APPLIED NANO MATERIALS（2023）

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Atomic Layer Deposition of Ru Thin Film Using a Newly Synthesized Precursor with Open‐Coordinated Ligands

Seung Hoon Oh,Jeong Min Hwang,Hyeonbin Park, Dongseong Park, Young Eun Song,Eun Chong Ko,Tae Joo Park,Taeyong Eom,Taek-Mo Chung

ADVANCED MATERIALS INTERFACESno. 17 (2023)

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New Heteroleptic Germanium Precursors for GeO2 Thin Films by Atomic Layer Deposition

Heenang Choi,Chanwoo Park,Sung Kwang Lee,Ji Yeon Ryu,Seung Uk Son,Taeyong Eom,Taek-Mo Chung

ACS omegano. 46 (2023): 43759-43770

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Heteroleptic Titanium Complexes Bearing Amidoxime Ligands As Precursors for TiN Thin Films ALD

Ga Yeon Lee,Taeyong Eom,Taek‐Mo Chung

Meeting abstracts/Meeting abstracts (Electrochemical Society CD-ROM)no. 29 (2023): 1794-1794

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