Thomas M. Shaw received the B.Eng. degree in metallurgy and materials science from the University of Liverpool, Liverpool, U.K., in 1975, and the M.S. and Ph.D. degrees in materials science from the University of California at Berkeley in 1978 and 1981, respectively. He received the John E. Dorn Award for his thesis. He is a Research Staff Member at the IBM Thomas J. Watson Research Center, Yorktown Heights, NY. He joined the Physical Sciences Department at IBM Research in 1984 and currently has a position in the Silicon Technology Department. Prior to joining IBM, he was a Member of the Technical Staff at Rockwell International's science center and a Postdoctoral Associate at Cornell University, Ithaca, NY. He has authored or co-authored more than 150 publications and holds 21 patents. His research interests include ferroelectric thin films, processing and microstructure control of ceramic materials, microscopy of materials, interfacial energy driven processes, liquid phase sintering, porous materials, diffusion in thin films, electrical and mechanical properties materials, and the reliability of interconnect structures. Dr. Shaw is a Fellow of the American Ceramics Society.