Shahid Rauf

Shahid Rauf received the Ph.D. degree in electrical engineering from the University of Wisconsin, Madison, in 1995. His graduate thesis focused on nonlinear properties of plasma waves and their application to fusion plasmas. Following his Ph.D., he was with the University of Illinois, Urbana, for three years, where his research dealt with computational modeling of plasma discharges, plasma applications in semiconductor processing and lighting, and plasma display panels. He was with the Semiconductor Products Sector (SPS) of Motorola, Inc. (subsequently Freescale Semiconductor) in December 1998. His work at Motorola SPS primarily focused on computational modeling of plasma processes and equipment used in commercial integrated circuit manufacturing. He has been with Applied Materials, Inc., Santa Clara, CA, since August 2006, where he currently directs the plasma technology team within the Silicon Systems Group. His team is responsible for computational modeling and plasma diagnostics for the design of plasma processing systems. He has published more than 60 articles in international scientific journals and presented more than 100 conference papers. His research addressed issues related to etching and deposition of thin films, atomic and molecular processes in processing plasmas, the dynamics of multifrequency magnetized plasmas, plasma-induced damage, surface processes during dielectric etching, and electrical performance of 3-D integrated circuits. Dr. Rauf has served on the program committee of the IEEE International Conference on Plasma Science numerous times, and has coedited two special issues of the IEEE Transactions on Plasma Science.