S Jelinek - Inst Plasma Phys, Czech Acad Sci

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论文共 13 篇作者统计合作学者相似作者

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Ion Emission from Warm Dense Matter Produced by Irradiation with a Soft X-Ray Free-Electron Laser

Josef Krasa,Tomas Burian,Vera Hajkova,Jaromir Chalupsky,Simon Jelinek, Katerina Frantalova,Michal Krupka,Zuzana Kuglerova,Sushil Kumar Singh,Vojtech Vozda,Ludek Vysin,Michal Smid,Pablo Perez-Martin, Marion Kuehlman,Juan Pintor,Jakub Cikhardt,Matthias Dreimann, Dennis Eckermann, Felix Rosenthal,Sam M. Vinko,Alessandro Forte,Thomas Gawne,Thomas Campbell,Shenyuan Ren,YuanFeng Shi, Trevor Hutchinson,Oliver Humphries,Thomas Preston,Mikako Makita,Motoaki Nakatsutsumi,Xiayun Pan,Alexander Koehler,Marion Harmand,Sven Toleikis,Katerina Falk,Libor Juha

MATTER AND RADIATION AT EXTREMES（2024）

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Comparison of Wavefront Sensing and Ablation Imprinting for FEL Focus Diagnostics at FLASH2

Barbara Keitel,Jaromir Chalupsky,Simon Jelinek,Tomas Burian,Siarhei Dziarzhytski,Vera Hajkova,Libor Juha,Zuzana Kuglerova,Marion Kuhlmann,Klaus Mann,Mabel Ruiz-Lopez,Bernd Schaefer,Vojtech Vozda,Thomas Wodzinski,Mikhail V. Yurkov,Elke Ploenjes

OPTICS EXPRESSno. 12 (2024): 21532-21552

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Comparing Single-Shot Damage Thresholds of Boron Carbide and Silicon at the European XFEL

Marziyeh Tavakkoly,Jaromir Chalupsky,Vera Hajkova,Wolfgang Hillert,Simon Jelinek,Libor Juha,Mikako Makita,Tommaso Mazza,Michael Meyer,Jacobo Montano,Harald Sinn,Vojtech Vozda,Maurizio Vannoni

Journal of synchrotron radiationno. Pt 5 (2024): 1067-1070

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Influence of the Magnetic Field on the Emission of Hot Electrons and Ions from Ablative Plasma Produced from a Disc-Coil Target Irradiated by the 3rd Harmonic of the PALS Iodine Laser

T. Pisarczyk,O. Renner,Z. Rusiniak,R. Dudzak,J. Domanski, W. Rafalak,T. Chodukowski,J. Badziak,M. Krupka, S. Singh,P. Tchorz,M. Rosinski,J. Krasa, S. Agraval,D. Klir,J. Cikhardt,A. Zaras-Szydlowska,J. Dostal, D. Ettel,C. Vlachos,M. Ehret,P. W. Bradford, H. Marchenko,P. Gajdos,M. Szymanski,S. Jelinek,R. Miklaszewski,D. Batani,K. Batani,J. Santos,V Ospina-Bohorquez,L. Volpe,S. Borodziuk,M. Krus,L. Juha

PLASMA PHYSICS AND CONTROLLED FUSIONno. 11 (2024)

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Analysis of Ablation Imprints Accelerated by Machine Learning (conference Presentation)

Vojtěch Vozda,Jaromír Chalupský,Jan Hering,Jan Kybic,Tomáš Burian, Katerina Frantálová,Věra Hájková,Šimon Jelínek,Libor Juha,Barbara Keitel,Zuzana Kuglerová,Marion Kuhlmann, Bohdan Petryshak,Mabel Ruiz-Lopez,Ludek Vyšín,Thomas A. Wodzinski,Elke Plönjes

Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8) (2023)

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Ion Emission from Plasmas Produced by Femtosecond Pulses of Short-Wavelength Free-Electron Laser Radiation Focused on Massive Targets: an Overview and Comparison with Long-Wavelength Laser Ablation

Josef Krása,Vincenzo Nassisi,Tomas Burian,Vera Hajkova,Jaromir Chalupsky,Simon Jelinek, Katerina Frantálová,Michal Krupka,Zuzana Kuglerová,Sushil K. Singh,Vojtech Vozda,Ludek Vysin,Jan Wild,Michal Smid,Pablo Perez-Martin, Xiayun Pan, Marion Kühlman,Juan Pintor,Jakub Cikhardt,Matthias Dreimann, Dennis Eckermann, Felix Rosenthal,Sam M. Vinko, Alessandro Forte,Thomas Gawne, Thomas Campbell,Shenyuan Ren,YuanFeng Shi,Trevor Hutchinson,Oliver Humphries,Thomas Preston,Mikako Makita, Motoaki Nakatsutsumi,Alexander Koehler,Marion Harmand, Sven Toleikis,Katerina Falk, Libor Juha

Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8) (2023)

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Extending the Ablation Imprints Method of Focal Spot Characterisation from X-ray to Visible and Near-Infrared Spectral Range (conference Presentation)

Šimon Jelínek,Tomáš Burian,Jan Dostál,Roman Dudžák,Věra Hájková,Libor Juha,Michal Krupka,Zuzana Kuglerová,Thomas M. Baumann,Simon Dold,Tommaso Mazza,Yevheniy Ovcharenko,Sergey Usenko, Michael Meyer,Jaromír Chalupský

Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8) (2023)

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Deep Learning for Laser Beam Imprinting

J. Chalupsky,V. Vozda, J. Hering,J. Kybic,T. Burian,S. Dziarzhytski, K. Frantalova,V Hajkova,S. Jelinek,L. Juha,B. Keitel, Z. Kuglerova,M. Kuhlmann, B. Petryshak,M. Ruiz-lopez,L. Vysin,T. Wodzinski,E. Ploenjes

Optics Expressno. 12 (2023): 19703-19703

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