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个人简介
Robert F. Hicks received the B.S. degree in chemical engineering from the University of Delaware, Newark, in 1977, and the Ph.D. degree in chemical engineering from the University of California, Berkeley, in 1984.
He has been with the faculty at the University of California, Los Angeles, since 1985, where he is currently a Professor of chemical engineering with the Department of Chemical and Biomolecular Engineering. He has authored over 150 scientific papers throughout his career. His research interests include physics, chemistry, and engineering of materials processes.
Dr. Hicks is a member of the AVS, TMS, and AIChE. In 2001, he was elected a fellow of the American Vacuum Society. In 1999, he received an R&D 100 Award for coinvention of the atmospheric-pressure plasma jet.
研究兴趣
论文共 258 篇作者统计合作学者相似作者
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SAMPE JOURNALno. 5 (2020): 16-25
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Hang Yu, Yiyuan Zhang,Anita Wong,Igor M. De Rosa, Han S. Chueh, Misha Grigoriev,Thomas S. Williams, Tommy Hsu,Robert F. Hicks
ADHESION IN MICROELECTRONICSpp.137-172, (2014)
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作者统计
#Papers: 265
#Citation: 12293
H-Index: 49
G-Index: 103
Sociability: 6
Diversity: 3
Activity: 8
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