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个人简介
Ravikumar Ramachandran IBM Systems, Hopewell Junction, NY
12533 USA (ravikuma@us.ibm.com). Dr. Ramachandran is a Senior Technical Staff Member in the IBM Systems
division and an elected member of the IBM Academy of Technology. He received a B.Tech. degree from the Indian
Institute of Technology, Kanpur, India, in 1989, and M.S. and Ph.D. degrees in material science and engineering from
the University of California at Berkeley in 1992 and 1996, respectively. He subsequently worked for Siemens
Semiconductor and Infineon Technologies at the IBM DRAM Development Alliance in Hopewell Junction, NY, USA. Since
2003, he has been working with IBM at the Semiconductor Research Development Center, working on different technology
nodes starting from the 90-nm SOI technology. He is a recipient of multiple IBM outstanding technical achievement
awards, and, in 2016, was recognized by the IBM Research division for his extraordinary contributions to the high-K
metal gate technology that had an impact on products at 32-nm, 28-nm, and 22-nm generations for IBM and Alliance
partners. He is author or coauthor on multiple publications and U.S. patents that have been incorporated in IBM
processors.
研究兴趣
论文共 1 篇作者统计合作学者相似作者
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S. R. Stiffler,R. Ramachandran, W. K. Henson, N. D. Zamdmer,K. McStay, G. La Rosa,K. M. Boyd,S. Lee,C. Ortolland,P. C. Parries
作者统计
#Papers: 1
#Citation: 11
H-Index: 1
G-Index: 1
Sociability: 2
Diversity: 0
Activity: 0
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