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论文共 33 篇作者统计合作学者相似作者

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Extending Deep-Uv Multi-Beam Laser Writing for Optical and EUV Masks
H. Christopher Hamaker,Paul C. Allen
NOVEL PATTERNING TECHNOLOGIES FOR SEMICONDUCTORS, MEMS/NEMS AND MOEMS 2020 (2020)
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Performance of the ALTA 4700 with Variable Print Strategy and Optimized Resist Process
Paul C. Allen,H. Christopher Hamaker,Cris Morgante, Andrew Berwick,Michael White
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2005)
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ALTA 4700 System Mask Patterning Performance Improvements for X-architecture and Wafer Electrical Performance Interchangeability with 50kv E-beam
PC Allen, M Bohan,ER Christenson,H Dai,M Duane,HC Hamaker, C Howells, B Kenan, P Pirogovsky, MK Sadiq, R Teitzel, M White
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2005)
引用2浏览0引用
2
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Next Generation Duv Alta Mask Patterning Capabilities
Paul C Allen,Michael J Bohan, Eric R Christenson,H Christopher Hamaker,Samuel C Howells, Boaz Kenan,Peter Pirogovsky, Malik K Sadiq,Robin Teitzel,Michael White, Michael E Ungureit, Alan J Wickstrom,Robert Kiefer,Curt Jackson
24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2 (2004): 279-290
引用5浏览0引用
5
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作者统计

#Papers: 33

#Citation: 610

H-Index: 16

G-Index: 23

Sociability: 4

Diversity: 1

Activity: 0

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