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论文共 486 篇作者统计合作学者相似作者

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Metrology-class EUV Light Source Based on Broadband Emission from Copper-Target Laser Produced Plasma
Seth L. Cousin, Feng Dong, Matt Hettermann,Dave Houser,Patrick Naulleau
High-Brightness Sources and Light-Driven Interactions Congress (2024)
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Metrology-class EUV Light Source Based on Quasi-Continuous Copper LPP
Seth L. Cousin, Feng Dong, Matt Hettermann, Dave Houser,Patrick Naulleau
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
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Zone Plate-Based Extreme Ultraviolet Mask Microscope with Through-Pellicle Imaging Capability
Markus P. Benk, Dmytro Zaytsev, C. Orman, Brandon Vollmer, Daniel Rodrigues dos Santos, Jeffrey F. Gamsby, Jeremy Mentz, F. Salmassi, Arnaud Allézy, Senajith Rekawa, Ryan Miyakawa, Weilun Chao, Eric M. Gullikson, Scott Chegwidden, Guojing Zhang,Patrick Naulleau, Bruno La Fontaine
Journal of Micro/Nanopatterning Materials and Metrologyno. 04 (2024)
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Effects of EUV multilayer roughness on 2D patterning
Luke T. Long,Stuart Sherwin,Ryan Miyakawa,Thomas V. Pistor, Matt Hettermann,Patrick Naulleau
Optical and EUV Nanolithography XXXVII (2024)
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Understanding and Measuring EUV Mask 3D Effects
Stuart Sherwin, Matt Hettermann,Dave Houser,Patrick Naulleau
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)
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Characterization of Latent Image of Electron Beam Resist Via Critical-Dimension Resonant Soft X-ray Scattering
Qi Zhang, Kas Andrle,Weilun Chao, Zhengxing Peng, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar,Alexander Hexemer,Patrick Naulleau, Bruno La Fontaine, Ricardo Ruiz,Cheng Wang
Journal of Micro/Nanopatterning, Materials, and Metrologyno. 04 (2024)
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Evaluation of Electron Blur for Different Electron Energies
Oleg Kostko, Maximillian Mueller,Patrick Naulleau
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGYno. 3 (2024): 315-320
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作者统计

#Papers: 486

#Citation: 6389

H-Index: 37

G-Index: 53

Sociability: 7

Diversity: 2

Activity: 13

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