Pieter Boelen - Applied Materials | 人才画像

基本信息

浏览量：10

职业迁徙

个人简介

暂无内容

研究兴趣

论文共 12 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选

Poly-Silicon Etch with Diluted Ammonia: Application to Replacement Gate Integration Scheme

Farid Sebai,Jose Ignacio Del Agua Borniquel,Rita Vos, Philippe Absil,Thomas Chiarella,Christa Vrancken,Pieter Boelen,Evans Baiya

Diffusion and defect data, solid state data Part B, Solid state phenomena/Solid state phenomena（2009）

引用5浏览0引用

Manufacturable Processes for $\leq$ 32-nm-node CMOS Enhancement by Synchronous Optimization of Strain-Engineered Channel and External Parasitic Resistances

Atif M. Noori,Mihaela Balseanu,Pieter Boelen,Andrew Cockburn,Steven Demuynck,Susan Felch,Srinivas Gandikota, A. Jerry Gelatos,Amit Khandelwal,Jorge A. Kittl, Anne Lauwers,Wen-Chin Lee,Jianxin Lei,Tushar Mandrekar,Robert Schreutelkamp,Kavita Shah,Scott E. Thompson,Peter Verheyen,Ching-Ya Wang,Li-Qun Xia,Reza Arghavani

IEEE TRANSACTIONS ON ELECTRON DEVICESno. 5 (2008): 1259-1264

引用40浏览0EIWOS引用

Full-field EUV and Immersion Lithography Integration in 0.186μm2 FinFET 6T-SRAM Cell

A. Veloso,S. Demuynck,M. Ercken,A. M. Goethals,M. Demand,J. -F. de Marneffe,E. Altamirano,A. De Keersgieter,C. Delvaux,J. De Backer,S. Brus,J. Hermans,B. Baudemprez,F. Van Roey, G. E. Lorasso,C. Baerts,D. Goossens, C. Vrancken, S. Mertens,J. J. Versluijs,V. Truffert, C. Huffman,D. Laidler,N. Heylen,P. Ong,B. Parvais,M. Rakowski,S. Verhaegen,A. Hikavyy, H. Meiling, B. Hultermans, L. Romijn, C. Pigneret,S. Lok,A. Van Dijk, K. Shah,A. Noori,J. Gelatos,R. Arghavani,R. Schreutelkamp,P. Boelen,O. Richard,H. Bender,L. Witters,N. Collaert, R. Rooyackers, P. Absil, A. Lauwers,M. Jurczak,T. Hoffmann, S. Vanhaelemeersch,R. Cartuyvels,K. Ronse, S. Biesemans

IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2008, TECHNICAL DIGESTpp.861-+, (2008)

引用17浏览0EIWOS引用

Scaling of the Cu(Al) seed layer thickness and its impact on the specific resistivity of sub-100 nm interconnects

Laureen Carbonell,Henny Volders, Asad Haider,Nancy Heylen,Olivier Richard,Roger Palmans,Youssef Travaly,Zsolt Tokei,Pieter Boelen, Aron Rosenfeld,Tushar Mandrekar,Jose Luis Hernandez,Serge Vanhaelemeersch

ADVANCED METALLIZATION CONFERENCE 2007 (AMC 2007) (2008): 221-227

引用0浏览0引用

Electrochemical Nucleation and Growth of Copper on Resistive Substrates

Aleksandar Radisic,Pieter Boelen, Aron Rosenfeld,Jose Luis Hernandez, Gerald Beyer,Philippe Vereecken

Meeting abstracts/Meeting abstracts (Electrochemical Society CD-ROM)no. 28 (2007): 1375-1375

引用0浏览0引用

Advanced Processes for Photomask Damage-Free Cleaning and Photoresist Removal

James S. Papanu,Roman Gouk,Han-Wen Chen,Pieter Boelen, Phillip Peters, Michael Belisle,Steven Verhaverbeke,Alexander Ko, Kent Child, Elias Martinez

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2006)

引用1浏览0引用

Megasonic cleaning with minimized interference

John S Lewis,Brian J Brown, Jun Zhao, Steven Vehaverbeke,Alexander Soukang Ko,Richard R Endo,Roman Gouk,Pieter Boelen

mag（2006）

引用23浏览0引用

Advanced Mask Cleaning Techniques for Sub-100-nm Technology Nodes

James S. Papanu,Roman Gouk, Cole Franklin,Han-Wen Chen,Steven Verhaverbeke,Alexander Ko, Kent Child,Pieter Boelen,Suresh Shrauti, Elias Martinez,Brian J. Brown

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2005)

引用2浏览0引用

Metallic Contamination Removal Evaluation for Single Wafer Processing

P Boelen,S Verhaverbeke, P Garnier,D Levy,H Morinaga

ULTRA CLEAN PROCESSING OF SILICON SURFACES V（2003）

引用6浏览0引用

New Aspects of the Diluted Dynamic Clean Process

F. Tardif,T. Lardin,A. Maciejny,Adrien Danel,Pieter Boelen,C. Cowache,Ismail Kashkoush,R. Novak

Solid State Phenomena（1999）

引用16浏览0引用

加载更多

作者统计

合作学者

合作机构

D-Core

合作者
学生
导师

暂无相似学者，你可以通过学者研究领域进行搜索筛选

数据免责声明

页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn