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Bio
Oliver D. Patterson (Senior Member, IEEE) received the S.B. degree in electrical engineering from the Massachusetts Institute of Technology, Cambridge, MA, USA, the M.S. degree in electrical engineering from the University of Wisconsin–Madison, Madison, WI, USA, and the Ph.D. degree in electrical engineering from the University of Michigan at Ann Arbor, Ann Arbor, MI, USA. He is a Distinguished Member of Technical Staff with ASML, San Jose, CA, USA. He serves the role of Principle Technologist for Hermes-Microvision, an ASML company and the industry’s leading E-beam inspection tool supplier. He has previously worked with GLOBALFOUNDRIES, IBM Microelectronics, Lucent Technologies, and Agere Systems. His research interests include the use of e-beam inspection for detection of voltage contrast, physical and pattern fidelity defects and yield improvement in general. He is a member of the ASMC Technical Committee and was the conference Co-Chairman for ASMC 2014. He has served as a Guest Editor for the IEEE Transactions on Semiconductor Manufacturing numerous times.
Research Interests
Papers共 108 篇Author StatisticsCo-AuthorSimilar Experts
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IEEE Transactions on Semiconductor Manufacturingno. 3 (2023): 307-310
IEEE transactions on semiconductor manufacturingno. 3 (2023): 345-350
2022 33RD ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC) (2022)
Wallace He, Camille Xu, Daniels Bae,Kunyuan Chen,Andy Lan,Richer Yang,Abdalmohsen Elmalk,Aiqin Jiang,Fuming Wang, Double Chung,Shane Su,Kuo-Feng Pao,Oliver D. Patterson,Sudharshanan Raghunathan,Marc Kea, Jason Liao
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021)
Changan Wang,Peigen Cao, Maxence Delorme,Jen-Yi Wuu, Jiyou Fu,Fuming Wang, Bob Lin,Yiqiong Zhao, Yi-Hsing Peng,Yongfa Fan,Mu Feng, Bin Cheng,Jen-Shiang Wang, Mark Simmoms,Stefan Hunsche,Oliver Patterson, Kevin Pao,Abdalmohsen Elmalk, Kevin Gao, Ruochong Fei, Xuefeng Zeng, Xiaolong Zhang
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII (2021)
Eric Ma,Weiming Ren,Xinan Luo, Shuo Zhao,Xuerang Hu,Xuedong Liu,Chiyan Kuan,Kevin Chou,Martijn Maassen,Weihua Yin, Aiden Chen, Niladri Sen,Martin Ebert,Lei Liu,Fei Wang,Oliver D. Patterson
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
Metrology, Inspection, and Process Control for Microlithography XXXIII (2019)
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Author Statistics
#Papers: 108
#Citation: 1630
H-Index: 24
G-Index: 38
Sociability: 6
Diversity: 2
Activity: 2
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