Michaela Vockenhuber - Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute

基本信息

浏览量：1

职业迁徙

个人简介

暂无内容

研究兴趣

论文共 74 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选

Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution

Luong Nguyen Dang,Li-Ting Tseng, Anil Rajak, Thomas Gädda,Markus Laukkanen, Jagadish Salunke, Shima Moosakkani,Jyri Paulasaari,Juha Rantala,Michaela Vockenhuber,Dimitrios Kazazis,Yasin Ekinci

Advances in Patterning Materials and Processes XLI (2024)

引用0浏览0引用

Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions

Quentin Evrard,Najmeh Sadegh,Simon Mathew,Ed Zuidinga,Benjamin Watts,Maximilian Paradiz Dominguez, Angelo Giglia,Nicola Mahne,Stefano Nannarone, Akira Nishimura,Tsuyoshi Goya,Takuo Sugioka,Michaela Vockenhuber,Yasin Ekinci,Albert M. Brouwer

ACS APPLIED MATERIALS & INTERFACESno. 32 (2024): 42947-42956

引用0浏览0WOS引用

Increasing the Sensitivity of Nonchemically Amplified Resists by Oxime Sulfonate-Functionalized Polystyrene

Huiwen An,Jinping Chen,Yi Zeng,Tianjun Yu,Shuangqing Wang,Xudong Guo,Rui Hu, Peng Tian,Michaela Vockenhuber,Dimitrios Kazazis,Yasin Ekinci,Guoqiang Yang,Yi Li

ACS APPLIED POLYMER MATERIALSno. 9 (2024): 5374-5384

引用0浏览0引用

Optimization Strategy for Epoxy Cross-Linked Molecular Glass Photoresist in EUV Lithography

Jiaxing Gao,Siliang Zhang,Xuewen Cui,Xue Cong,Xudong Guo,Rui Hu,Shuangqing Wang,Jinping Chen,Yi Li, Peng Tian,Michaela Vockenhuber,Dimitrios Kazazis,Yasin Ekinci,Guoqiang Yang

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY (2024)

引用0浏览0引用

Heterometallic Ti-Zr Oxo Nanocluster Photoresists for Advanced Lithography

Yang Qiao, Guangyue Shi, Ou Zhang, You Li,Michaela Vockenhuber,Yasin Ekinci,Feng Luo,Lei Zhang

SCIENCE CHINA-MATERIALSno. 10 (2024): 3132-3141

引用0浏览0引用

Extreme Ultraviolet Lithography Reaches 5 Nm Resolution

Iason Giannopoulos,Iacopo Mochi,Michaela Vockenhuber,Yasin Ekinci,Dimitrios Kazazis

NANOSCALEno. 33 (2024)

引用0浏览0WOS引用

Iodonium Functionalized Polystyrene As Non-Chemically Amplified Resists for Electron Beam and Extreme Ultraviolet Lithography

Xindi Yao, Peng Lian,Jinping Chen,Yi Zeng,Tianjun Yu,Shuangqing Wang,Xudong Guo,Rui Hu, Peng Tian,Michaela Vockenhuber,Dimitrios Kazazis,Yasin Ekinci,Guoqiang Yang,Yi Li

RSC Applied Polymersno. 5 (2024): 870-879

引用0浏览0引用

Nonchemically Amplified Molecular Resist Based on Multi-Sulfonium Modified Triptycene for Electron Beam and Extreme Ultraviolet Lithography

Xiaodong Yuan, Jinping Chen, Tianjun Yu,Yi Zeng, Xudong Guo,Shuangqing Wang,Rui Hu, Peng Tian,Michaela Vockenhuber,Dimitrios Kazazis,Yasin Ekinci,Jun Zhao,Yanqing Wu,Guoqiang Yang,Yi Li

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 3 (2024)

引用0浏览0引用

EUV lithography reaches 5 nm half-pitch

Iason Giannopoulos,Iacopo Mochi,Michaela Vockenhuber,Yasin Ekinci,Dimitrios Kazazis

Optical and EUV Nanolithography XXXVII (2024)

引用0浏览0引用

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Mohammad S. M. Saifullah, Anil Kumar Rajak,Kevin A. Hofhuis,Nikhil Tiwale,Zackaria Mahfoud, Andrea Testino,Prajith Karadan,Michaela Vockenhuber,Dimitrios Kazazis,Suresh Valiyaveettil,Yasin Ekinci

ACS NANOno. 35 (2024): 24076-24094

引用0浏览0WOS引用

加载更多

作者统计

合作学者

合作机构

D-Core

合作者
学生
导师

暂无相似学者，你可以通过学者研究领域进行搜索筛选

数据免责声明

页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn