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个人简介
Mohan Rao Gowravaram was born in India in 1955. He received the M.Sc. degree in physics from Sri Venkateswara University, Tirupathi, India, and the Ph.D. degree from the Indian Institute of Science (IISc), Bangalore, India.
He is currently a Professor with the Department of Instrumentation, IISc. Currently, his group is working on hard nitride coatings, thin-film energy devices, and surface modification of polymers. His research interests include thin-film technology and surface engineering using plasma processes.
研究兴趣
论文共 312 篇作者统计合作学者相似作者
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Anagha Manohar,Akshayakumar Kompa, Benedict Christopher,Suranjan Shil,K. Mohan Rao, N. K. Udayshankar,M. G. Mahesha, Vikash Singh,U. Chaitra
Inorganic chemistry communications/Inorganic chemistry communications (Online) (2024): 111807-111807
Physica B, Condensed matter (2024): 415605-415605
MATERIALS CHEMISTRY AND PHYSICS (2024)
Journal of Materials Scienceno. 11 (2023): 4901-4921
CERAMICS INTERNATIONALno. 11 (2023): 18272-18280
arxiv(2023)
arxiv
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作者统计
#Papers: 315
#Citation: 5808
H-Index: 38
G-Index: 57
Sociability: 6
Diversity: 4
Activity: 110
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