Karol Fröhlich was born in 1954. He received the Ph.D. degree in material science from the Slovak Academy of Sciences, Bratislava, Slovakia, in 1998. He is the leader of the group for preparation of thin oxide films by chemical vapor deposition and atomic layer deposition. From 2002 to 2012 he was appointed as the Director of the Institute of Electrical Engineering, Slovak Academy of Sciences. He is author and co-author of about 110 publications in peer-reviewed international journals. His current research includes applications of thin oxides films for memory application (resistive switching), insulation/passivation of GaN-based electronic devices using thin oxide films and growth of oxide films on graphene.