Jangho Shin

Jangho Shin received the B.S. degree in electronic materials science from the University of Suwon, Suwon, Korea, in 1994, the M.S. degree in mathematics from Chicago State University, Chicago, IL, in 1996, and the Ph.D. degree in electrical and computer engineering from the University of Wisconsin, Madison, in 2003. During his doctoral studies, the main emphasis was on the application of the atomic force microscope with a carbon nanotube tip to the characterization of the image formation process of advanced lithographies (X-rays, EUV, and electrons). He joined the Semiconductor Research and Development Center, Samsung Electronics Company, Ltd., Gyeonggi-Do, Korea, in 2003. His current research activities are overlay metrology and optical lithography for sub-80-nm DRAM and Flash memory products.