基本信息
浏览量:18
职业迁徙
个人简介
Dan J. Dechene received the BEng degree in electrical engineering from Lakehead University, Thunder Bay, Ontario, Canada, in 2006. He received the master's and PhD degrees in electrical and computer engineering from the University of Western Ontario, London, Canada, in 2008 and 2012, respectively, with a research focus on energy efficient resource allocation techniques and multiple antenna systems. He is an engineer at IBM's Semiconductor Research and Development Center in Hopewell Junction, New York. He is a member of the IEEE.
研究兴趣
论文共 29 篇作者统计合作学者相似作者
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2024 35TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, ASMC (2024)
IEEE transactions on electron devices/IEEE transactions on electron devicesno. 12 (2022): 7135-7140
J. Wang,S. D. Suk, A. Chu,T. Hook, A. Young,R. Krishnan,R. Bao,I. Seshadri,B. Senapati,V. Zalani,T. Philip, H. Zhou,K. Zhao,D. Dechene,B. Haran,D. Guo,H. Bu
2021 Symposium on VLSI Technologypp.1-2, (2021)
引用3浏览0EIWOS引用
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H. Jagannathan,B. Anderson,C-W Sohn,G. Tsutsui,J. Strane,R. Xie,S. Fan,K- Kim,S. Song,S. Sieg,I Seshadri,S. Mochizuki,J. Wang,A. Rahman, K-Y Cheon,I Hwang,J. Demarest,J. Do, J. Fullam, G. Jo, B. Hong,Y. Jung, M. Kim, S. Kim, R. Lallement,T. Levin, J. Li,E. Miller, P. Montanini,R. Pujari, C. Osborn,M. Sankarapandian,G-H Son,C. Waskiewicz,H. Wu,J. Yim, A. Young,C. Zhang, A. Varghese,R. Robison,S. Burns, K. Zhao, T. Yamashita,D. Dechene,D. Guo,R. Divakaruni,T. Wu,K- Seo,H. Bu
2021 IEEE International Electron Devices Meeting (IEDM) (2021)
J. Zhang,J. Frougier,A. Greene,X. Miao,L. Yu,R. Vega, P. Montanini,C. Durfee,A. Gaul,S. Pancharatnam, C. Adams,H. Wu,H. Zhou,T. Shen,R. Xie,M. Sankarapandian,J. Wang,K. Watanabe,R. Bao, X. Liu, C. Park, H. Shobha,P. Joseph,D. Kong, A. Arceo De La Pena, J. Li,R. Conti,D. Dechene,N. Loubet,R. Chao,T. Yamashita,R. Robison,V. Basker, K. Zhao,D. Guo,B. Haran,R. Divakaruni,H. Bu
R. Bao,R. Vega,S. Pancharatnam,P. Jamison, M. Wang,N. Loubet,V. Basker,D. Dechene,D. Guo,B. Haran,H. Bu,K. Watanabe,M. Khare,J. Zhang,J. Guo,H. Zhou,A. Gaul,M. Sankarapandian, J. Li, A. R. Hubbard
S. Narasimha,B. Jagannathan,A. Ogino,D. Jaeger,Brian J. Greene,C. Sheraw, K. Zhao, B. S. Haran,Unoh Kwon, A. K. M. Mahalingam,B. Kannan, B. Morganfeld,J. Dechene,C. Radens, A. Tessier, A. Hassan, H. Narisetty,I. Ahsan,M. Aminpur, C. An,M. Aquilino,A. Arya,Rod Augur, N. Baliga, R. Bhelkar,G. Biery,A. Blauberg, N. Borjemscaia,A. Bryant,L. Cao, V. Chauhan, M. Chen, L. Cheng, J. Choo,C. Christiansen,Tao Chu,B. Cohen, R. Coleman,D. Conklin, S. Crown, A. da Silva,D. Dechene, G. Derderian, S. Deshpande, G. Dilliway, K. Donegan,Manfred Eller, Y. Fan,Q. Fang, A. Gassaria,R. Gauthier,S. Ghosh, G. Gifford,T. Gordon,M. Gribelyuk, G. Han, J.H. Han, K. Han, M. Hasan,J. Higman,J. Holt, L. Hu, L. Huang,C. Huang,T. Hung,Y. Jin, J. Johnson, S. Johnson,V. Joshi,M. Joshi,P. Justison, S. Kalaga,T. Kim, W. Kim,R. Krishnan,B. Krishnan,K. Anil, M. Kumar, J. Lee,R. Lee,J. Lemon,S.L. Liew, P. Lindo,M. Lingalugari, M. Lipinski, P. Liu, Jinping Liu, S. Lucarini,W. Ma,E. Maciejewski, S. Madisetti, A. Malinowski,J. Mehta,C. Meng,S. Mitra, C. Montgomery,H. Nayfeh,T. Nigam,G. Northrop,K. Onishi, C. Ordonio,M. Ozbek,Rohit Pal,Sanjay Parihar,O. Patterson,E. Ramanathan,I. Ramirez,R. Ranjan, J. Sarad,V. Sardesai, S. Saudari, C. Schiller,Biswanath Senapati, C. Serrau, N. Shah,T. Shen,H. Sheng,J. Shepard, Y. Shi,M.C. Silvestre,D. Singh, Z. Song, J. Sporre,P. Srinivasan, Z. Sun,A. Sutton,R. Sweeney,K. Tabakman, M. Tan, X. Wang,E. Woodard, G. Xu, D. Xu, T. Xuan,Y. Yan, J. Yang,K.B. Yeap, M. Yu,A. Zainuddin, J. Zeng, K. Zhang, M. Zhao, Y. Zhong,Rick Carter,Chung-hsun Lin,Stephan Grunow,C. Child, M. Lagus, Robert Fox,E. Kaste, G. Gomba,Srikanth Samavedam,P. Agnello,D. K. Sohn
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2016)
PHOTOMASK TECHNOLOGY 2016 (2016)
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作者统计
#Papers: 29
#Citation: 499
H-Index: 12
G-Index: 22
Sociability: 5
Diversity: 2
Activity: 1
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