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个人简介
Cedric Monget received the Engineer degree in physics from the Institut National Polytechnique de Grenoble, Grenoble, France, in 1996 and the M.S. and Ph.D. degrees in materials science from the University Joseph Fourier de Grenoble, Grenoble, in 1996 and 1999, respectively.
Since 1999, he has been an RD Process Engineer with STMicroelectronics, Crolles, France, where he has been working on back-end-of-line (BEOL) etching processes and then switched to BEOL lithography applications. Since 2007, in addition of the expertise on advanced resist processes, he has been in charge of the coordination of C045 BEOL process integration.
研究兴趣
论文共 51 篇作者统计合作学者相似作者
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Benjamin Duclaux,Maxime Gatefait,Alice Pelletier, Laurent Lecarpentier, Pierre Leveque,Cedric Monget
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
Benjamin Duclaux,Alice Pelletier,Jean De-Caunes, Robin Perrier,Laurene Babaud,Maxime Gatefait, Olivier Fagart,Nicolas Thivolle, Mathieu Guerabsi,Jean-Damien Chapon, Bruno Perrin,Cedric Monget
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXII (2018): 292-304
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VIII (2016)
M. Gatefait,A. Lam,B. Le Gratiet,M. Mikolajczak,V. Morin, N. Chojnowski, Z. Kocsis, I. Smith,J. Decaunes, A. Ostrovsky,C. Monget
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2015)
Bertrand Le-Gratiet,Jean De-Caunes,Maxime Gatefait,Auguste Lam,Alain Ostrovsky,Jonathan Planchot,Vincent Farys,Julien Ducote,Marc Mikolajczak,Vincent Morin, Nicolas Chojnowski,Frank Sundermann,Alice Pelletier,Regis Bouyssou,Cedric Monget,Jean Damien Chapon,Bastien Orlando,Laurene Babaud,Celine Lapeyre,Emek Yesilada, Anna Szucs,Jean-Christophe Michel,Latifa Desvoivres,Onintza Ros Bengoechea,Pascal Gouraud
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作者统计
#Papers: 51
#Citation: 487
H-Index: 15
G-Index: 20
Sociability: 6
Diversity: 2
Activity: 0
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